$B9V1i(B $B;~9o(B | $B9V1i(B $BHV9f(B | $B9V1iBjL\!?H/I=$B%-!<%o!<%I(B | $BJ,N`(B | $BHV9f(B $B | |
---|---|---|---|---|---|
(9:40$B!A(B11:00)$B!!(B($B:BD9(B $B?y;3(B $B@5OB(B) | |||||
A203 | $BG.(BCVD$BK!$G:n@=$7$?(BSr-Ti$B;@2=J*GvKl$NAH@.(B | CVD EDX Strontium Titanate | S-45 | 510 | |
A204 | $B%b%N%a%A%k%7%i%s%,%9$K$h$kB?7k>=(BSiC$BGvKlDc29@.D9(B | SiC Monomethylsilane CVD | S-45 | 33 | |
A205 | RF$BHsJ?9U%W%i%:%^>l$rMQ$$$?9bJ,;6%J%NN3;R9g@.%W%m%;%9(B | Non-agglomerated particle Nonequilibrium plasma Unipolar charge | S-45 | 953 | |
A206 | $BC1AX%+!<%\%s%J%N%A%e!<%V$N?bD>G[8~@.D9$K$*$1$k(BAl2O3$B2 | single-walled carbon nantoube Co catalyst Al2O3 underlayer | S-45 | 629 | |
(11:00$B!A(B12:00)$B!!(B($B:BD9(B $B@%8M(B $B>OJ8(B) | |||||
A207 | CO$B$rC:AG8;$H$9$k%W%i%:%^(BCVD$B$K$h$kC:AG7O9b5!G=:`NA9g@.(B | Plasma enhanced CVD Carbon nanowall Carbon nanofiber | S-45 | 712 | |
A208 | $BD6NW3&Fs;@2=C:AGCf$K$*$1$k6bB0;@2=J*GvKl$N:n@=(B | supercritical carbon dioxide deposition metal oxide thin film | S-45 | 706 | |
A209 | In-situ$B@V30J,8wJ,@O$rMQ$$$?1_4I7?(BCVD$BH?1~4oFb$N(B2$B | Pyrocarbon CVD Infrared absorption | S-45 | 62 | |
(13:00$B!A(B13:40)$B!!(B($B;J2q(B $B2O@%(B $B85L@(B) | |||||
A213 | [$BE8K>9V1i(B] $B5$AjH?1~$K$h$kN3;R@8@.$H%b%G%j%s%0(B | CVD Particle formation Modeling | S-45 | 60 | |
(13:40$B!A(B15:00)$B!!(B($B:BD9(B $B=);3(B $BBY?-(B) | |||||
A215 | $BC1J,;6%(%"%m%>%k?(G^$rMQ$$$?(BCNT$B$N5$Aj9g@.(B | Carbon nanotube Laser ablation Chemical vapor deposition | S-45 | 418 | |
A216 | $BE:2C:^%U%j!<$G$NC1AX%+!<%\%s%J%N%A%e!<%V!&%5%V%_%j%a!<%?@.D9(B | single-walled carbon nanotubes rapid growth growth mechanism | S-45 | 710 | |
A217 | $B%J%N%5%$%:%/%i%9%?!<$NBO@Q$K$h$kI=LL7ABV$N7A@.2aDx(B | Cluster Nanostructure Thin Film | S-45 | 917 | |
A218 | $BHy:Y9&Kd$a9~$_%W%m%;%9$H$7$F$N(BCVD$B$HD6NW3&GvKl7A@.K!$NHf3S(B | Supercritical fluid Chemical vapor deposition Step coverage | S-45 | 737 |