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$B:G=*99?7F|;~!'(B2022-01-31 16:50:01

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$B$F$$$k%-!<%o!<%I(B		$B%-!<%o!<%I(B$B
CVD5$B7o(B*
CVI2$B7o(B
Numerical simulation2$B7o(B
Chemical Vapor Deposition2$B7o(B
thermal annealing1$B7o(B

$B$BHV9f(B$B9V1iBjL\!?H/I=$B%-!<%o!<%I(B$BH/I=7A<0(B
40$B;01v2=%[%&AG%,%9$H%b%N%a%A%k%7%i%s%,%9$K$h$kGvKl7A@.(B
($B2#9qBg1!9)(B) $B<<0f(B $B8w;R(B$B!&(B ($B@5(B)$B!{1)?<(B $BEy(B		Chemical vapor deposition
Silicon-Boron film
Mechanism
O
142$BD6NW3&N.BNGvKlBO@QK!$G:n@=$7$?;@2=%A%?%s$N8w?(G^3h@-$H7k>=@-$X$NE:2CJ*$N8z2L(B
($BElBg1!9)(B) ($B3X(B)$B!{0B<#(B $BNKM4(B$B!&(B ($B@5(B)$B=P1:(B $BEm;R(B$B!&(B ($BEl9)BgJ*$B!&(B ($BElBg1!9)(B) ($B@5(B)$BAz3@(B $B9,9@(B$B!&(B ($B@5(B)$BI4@%(B $B7r(B		supercritical fluid deposition
photocatalyst
crystallinity
O
154One-step fabrication of CuO-loaded TiO2 nanoparticulate thin film for photocatalytic application under visible light irradiation
(Hiroshima U.) ($B3X(B)$B!{(BHudandini Meditha$B!&(B Jiang Dianping$B!&(B (ITS) Kusdianto K$B!&(B (Hiroshima U.) ($B@5(B)Kubo Masaru$B!&(B ($B@5(B)Shimada Manabu		PECVD-PVD
nanocomposite
heterojunction
O
375$B%S%9%^%9$r86NA$H$7$?B@M[EECSMQ%Z%m%V%9%+%$%HGvKl(BCVD$B%W%m%;%9$N3+H/(B
($B5~Bg9)(B) ($B3X(B)$B!{8M>e(B $B7IEP(B$B!&(B ($B3X(B)$B>>ED(B $BK((B$B!&(B $BML(B $B;g8w(B$B!&(B ($B@5(B)$B2O@%(B $B85L@(B		CVD
perovskite
methylammonium bismuth iodide
O
514[$BE8K>9V1i(B] $BH?1~@-%W%i%:%^$rMQ$$$?%J%NN3;R$N@.D9@)8f$H$=$N1~MQE83+(B
($B6eBg%7%9>p(B) $B8E4W(B $B0l7{(B		CVD
nano-particles
growth control
O
516[$B>7BT9V1i(B] $BD9<\!&9bL)%+!<%\%s%J%N%A%e!<%V(B(CNT)$B!&%"%l%$$+$i:n@=$9$k(BCNT$B4%<0KB@S;e$NJ*@-@)8f$H%(%M%k%.!
($B2,;3Bg1!<+A3(B) $BNS(B $BLwI'(B		Carbon nanotube (CNT) arrays
Dry Spinning CNT yarns
Energy and mechanical devices
O
517[$BE8K>9V1i(B] $BH>F3BN%a%b%j$N5;=Q!&7P:Q!&;:6H$N8=:_$HH/E8$9$kL$Mh(B
($B%^%$%/%m%s%a%b%j%8%c%Q%s(B) $B@DEV(B $B$J$[$_(B		CVD
semiconductor memory
industry
O
519[$B>7BT9V1i(B] $B%W%i%:%^>H
($B3KM;9g8&(B) $B0KF#(B $BFF;K(B		CVD
plasma
numerical simulation
O
562CVI$BK!$rMQ$$$?%;%i%_%C%/%94pJ#9g:`NA@=B$H?1~4oFb$N?tCM%7%_%e%l!<%7%g%s(B
($BL>Bg(B) ($B3X(B)$B!{>.@n(B $BC#Li(B$B!&(B ($B@5(B)$BJ!K\(B $B0l@8(B$B!&(B ($B@5(B)$BD.ED(B $BMN(B$B!&(B ($B@5(B)$BB'1J(B $B9TMG(B		CVI
Numerical simulation
MTS
O
594$B%Q%k%96!5k(BALD$B$K$*$1$k86NA5$2=FC@-$N8!F$(B
($BElBg1!9)(B) ($B3X(B)$B!{;38}(B $B=a(B$B!&(B ($B@5(B)$B=P1:(B $BEm;R(B$B!&(B ($B@5(B)$BI4@%(B $B7r(B$B!&(B ($B%@%$%-%s9)6H(B) ($BK!(B)$B>>1J(B $BN49T(B$B!&(B ($BK!(B)$B;3Fb(B $B><2B(B$B!&(B ($BK!(B)$B4_@n(B $BMN2p(B$B!&(B ($BElBg1!9)(B) ($B@5(B)$BAz3@(B $B9,9@(B		ALD
precursor
vaporization
O
629$BD6NW3&(BCO2$B$rH?1~>l$H$7$?M-5!=$>~;@2=E4%J%N7k>=$ND>@\9g@.(B
($BEl9)BgJ*$B!&(B $B4#C+(B $B7$B!&(B ($B3X(B)Wijakmatee Thossaporn$B!&(B ($B@5(B)$B2<;3(B $BM52p(B		Supercritical carbon dioxide
iron oxide nanocrystals
organic modification
O
672Enhanced CO2-assisted growth of single-wall carbon nanotube arrays with Fe/AlOx catalyst annealed without CO2
($BAaBgM}9)Am8&(B) ($B@5(B)$B!{M{(B $BKOUb(B$B!&(B ($BAaBg@h?JM}9)(B) ($B3X(B)$B0B0f(B $B9@B@O:(B$B!&(B ($B6a5&Bg(B) ($B@5(B)$B?yL\(B $B91;V(B$B!&(B ($BAaBg@h?JM}9)(B) ($B@5(B)$BLnED(B $BM%(B		chemical vaper deposition
thermal annealing
single-wall carbon nanotubes
O
689SiCf/SiC CMC$B9g@.$N$?$a$NGS=P%,%92~
($BElBg1!9)(B) ($B3X(B)$B!{Bg9b(B $BM:J?(B$B!&(B ($B@5(B)$B:4F#(B $BEP(B$B!&(B (IHI) ($B@5(B)$BJ!Eg(B $B9/G7(B$B!&(B ($BElBg1!9)(B) ($B@5(B)$B=P1:(B $BEm;R(B$B!&(B ($B@5(B)$BI4@%(B $B7r(B$B!&(B ($B@5(B)$BAz3@(B $B9,9@(B		SiC
reuse
CVI
O
785$BM}O@E*8!F$$K4p$E$$$?(BTiAlN-CVD$B%W%m%;%9$K$*$1$k5$AjAGH?1~5!9=9=C[(B
($BElBg1!9)(B) ($B@5(B)$B!{:4F#(B $BEP(B$B!&(B ($B3X(B)$B;38}(B $B=a(B$B!&(B ($B5~%;%i(B) ($BK!(B)$B5WJ](B $BH;?M(B$B!&(B ($BK!(B)$B?y;3(B $B5.8g(B$B!&(B ($BElBg1!9)(B) ($B@5(B)$B=P1:(B $BEm;R(B$B!&(B ($B@5(B)$BI4@%(B $B7r(B$B!&(B ($B5~%;%i(B) ($BK!(B)$BC+^<(B $B1I?N(B$B!&(B ($BElBg1!9)(B) ($B@5(B)$BAz3@(B $B9,9@(B		TiAlN
CVD
Elementary reaction model
O
792$BB?7k>=(BSiC-CVD$B%W%m%;%9@_7W$rL\;X$7$?Am3gH?1~%b%G%k$N9=C[$H8!>Z(B
($BElBg1!9)(B) ($B3X(B)$B!{;U0f(B $B^fJ?(B$B!&(B ($B3X(B)$B1|(B $BM'B'(B$B!&(B ($B@5(B)$B=P1:(B $BEm;R(B$B!&(B ($B@5(B)$BI4@%(B $B7r(B$B!&(B ($B@5(B)$BAz3@(B $B9,9@(B		Chemical Vapor Deposition
silicon carbide
macrocavity method
O
863Ti[N(CH3)2]4$B$rMQ$$$?%W%i%:%^(BCVD$BK!$K$h$k(BTiCN$BKl$N:n@=(B
($B:eI\Bg1!9)(B) ($B3X(B)$B!{C]Fb(B $BN&(B$B!&(B ($B@5(B)$B2,K\(B $B>0$B!&(B ($B@5(B)$BsnF#(B $B>f{J(B		plasma CVD
TDMAT
TiCN
O
864$BF3BNMQG[@~:`NA$H$7$F$N(B MAX$B2=9gJ*$N@=Kl$HI>2A(B
($B:eI\Bg1!9)(B) ($B3X(B)$B!{>(B $BOB?-(B$B!&(B ($B:eI\Bg9)(B) $B>eED(B $BOB5.(B$B!&(B ($B:eI\Bg1!9)(B) ($B@5(B)$B2,K\(B $B>0$B!&(B ($B@5(B)$BsnF#(B $B>f{J(B		Max Phase
semiconductor
O
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(C) 2022 $B8x1W
Most recent update: 2022-01-31 16:50:01
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