$B$BHV9f(B | $B9V1iBjL\!?H/I=$B%-!<%o!<%I(B | $B | |
52 | SiC-CVD$B%W%m%;%9H?1~5!9=$N%^%k%A%9%1!<%k2r@O(B(2) ($BElBg1!9)(B) $B!{(B($B3X(B)$BJ!Eg(B $B9/G7(B$B!&(B ($BElBg9)(B) $BgULg(B $BM$0l(B$B!&(B ($BElBg1!9)(B) $B:4F#(B $BEP(B$B!&(B (IHI$B4pHW8&(B) $BJ]8MDM(B $B>?(B$B!&(B ($BElBg1!9)(B) ($B@5(B)$BI4@%(B $B7r(B$B!&(B ($B@5(B)$BAz3@(B $B9,9@(B | Silicon Carbide CVD Reaction Kinetics
| 11/29 20:15:20 |
248 | Ni-Fe$B7OAX>uJ#?e;@2=J*%J%NN3;R$r?(G^A06nBN$KMQ$$$?%+!<%\%s%J%N%3%$%k$N9g@.(B ($B:eI\Bg9)(B) $B!{(B($B3X(B)$BIZ_7(B $B@/;K(B$B!&(B ($B@5(B)$B4d:j(B $BCR9((B$B!&(B ($B@5(B)$BCgB<(B $B1QLi(B$B!&(B ($B@5(B)$BLJLn(B $BE/(B | carbon nanocoil chemical vapor deposition layered double hydroxide
| 12/8 09:48:17 |
303 | $B%3%P%k%H%;%s$H%"%s%b%K%"2rN% ($BBgM[F|;@(B/$BElBg(B) $B!{(B($B@5(B)$B@6?e(B $B=(<#(B$B!&(B ($BBgM[F|;@(B) $BGwED(B $B70(B$B!&(B ($BElBg(B) ($B@5(B)$BI4@%(B $B7r(B$B!&(B ($B@5(B)$BAz3@(B $B9,9@(B | Hot-wire ALD exhaust gas
| 12/8 17:33:21 |
321 | $B6/<'@-6bB0$N%(%C%A%s%0A*Br@-$K5Z$\$9J|EE>r7o$N1F6A(B ($BEl9)Bg1!M}9)(B) $B!{(B($B3X(B)$B:4F#(B $BF;5.(B$B!&(B ($B@5(B)$B?9(B $B?-2p(B$B!&(B ($B@5(B)$BNkLZ(B $B@5><(B | plasma etching transition metal CCP
| 12/8 19:37:03 |
326 | Fabrication of a-C:H thin film by Atmospheric Pressure Plasma Jet for Liquid Crystal Alignment ($BEl9)Bg1!M}9)(B) $B!{(B($B3X(B)Baitukha Alibi$B!&(B ($B@5(B)$B?9(B $B?-2p(B$B!&(B ($B@5(B)$BNkLZ(B $B@5><(B | Atmospheric Pressure Plasma Jet Liquid Crystal alignment Thin film deposition
| 12/8 19:57:48 |
416 | $B0[$J$kC:AG86NA$rMQ$$$?(BPECVD$BK!$G$N(BTi$B7O9E2A(B ($B:eI\Bg1!9)(B) $B!{(B($B3X(B)$B@/2,(B $B90PR(B$B!&(B ($B:eI\Bg9)(B) $B>>K\(B $B:4OB;R(B$B!&(B ($B:eI\Bg1!9)(B) ($B@5(B)$B2,K\(B $B>0$B!&(B ($B@5(B)$BsnF#(B $B>f{J(B$B!&(B ($B@5(B)$B6aF#(B $BOBIW(B$B!&(B ($B%"%k%F%C%/%9(B) $BRy(B $BCRFW(B | film growth chemical vapor deposition titanium carbide
| 12/9 13:52:59 |
542 | $BC1AX%+!<%\%s%J%N%A%e!<%V$N2P1j9g@.(B ($BElBg1!9)(B) ($B3X(B)$BBgEg(B $B=_(B$B!&(B ($B@5(B)$BBgBt(B $BMxCK(B$B!&(B $B!{(B($B@5(B)$BLnED(B $BM%(B | carbon nanotubes flame synthesis catalytic chemical vapor deposition
| 12/9 17:57:20 |
548 | $BIbM7?(G^(BCVD$BK!$K$h$kC1AX%+!<%\%s%J%N%A%e!<%V$N9g@.$H9=B$@)8f(B ($BElBg1!9)(B) $B!{(B($B3X(B)$B:4F#(B $B2BK.(B$B!&(B ($B@5(B)$BBgBt(B $BMxCK(B$B!&(B ($B@5(B)$BLnED(B $BM%(B | carbon nanotubes chemical vapor deposition catalyst
| 12/9 18:01:18 |
565 | $B5.6bB0%U%j!<;@2=J*EE6K$rMQ$$$?6/M6EEBN%-%c%Q%7%?$N:n@=$HI>2A(B ($B:eI\Bg1!9)(B) $B!{(B($B3X(B)$BDT(B $BE0(B$B!&(B ($B:eI\Bg9)(B) ($B3X(B)$B|bED(B $B`v;R(B$B!&(B ($B:eI\Bg1!9)(B) ($B@5(B)$B2,K\(B $B>0$B!&(B ($B@5(B)$BsnF#(B $B>f{J(B$B!&(B ($B@5(B)$B6aF#(B $BOBIW(B$B!&(B $B5HB<(B $BIp(B$B!&(B $BF#B<(B $B5*J8(B$B!&(B ($B:eBg;:8&(B) $BKLEg(B $B>4(B$B!&(B $BBgEg(B $BL@Gn(B | ferroelectric material pulsed laser deposition conductive oxide
| 12/9 18:28:02 |
602 | $BD6NW3&Fs;@2=C:AGCf$G$N6bB0;@2=J*GvKl7A@.$HH?1~5!9=2r@O(B ($B:eI\Bg1!9)(B) $B!{(B($B3X(B)$B>.Eg(B $B>O8w(B$B!&(B ($B3X(B)$BW"ED(B $BM40lO:(B$B!&(B ($B3X(B)$BCfED(B $B^+$B!&(B ($B@5(B)$B2,K\(B $B>0$B!&(B ($B@5(B)$BsnF#(B $B>f{J(B$B!&(B ($B@5(B)$B6aF#(B $BOBIW(B$B!&(B ($BElKLBgB?858&(B) ($B@5(B)$B9b8+(B $B@?0l(B | supercritical carbon dioxide metal oxide thin film
| 12/9 19:34:17 |
657 | [$BJ,2J2q>)Ne>^(B]CVD$BH?1~J,2J2q>)Ne>^^<0(B ($BElBg1!9)(B) $B!{(B($B@5(B)$BI4@%(B $B7r(B$B!&(B ($B3X(B)$BJ!Eg(B $B9/G7(B$B!&(B ($B3X(B)$BA}ED(B $BN5Li(B | CVD reaction enginnering encouraging prize
| 12/9 21:26:09 |
666 | $B5$8G86NA(BCVD$B$K$h$kJ#9gKl9g@.>r7o$N8!F$(B ($B9-Bg1!9)(B) $B!{(B($B3X(B)$BEb:j(B $B7rB@O:(B$B!&(B ($B3X(B)$B;3K\(B $BMN>4(B$B!&(B ($B@5(B)$BEgED(B $B3X(B | thin film nanoparticle composite material
| 12/9 21:53:38 |