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SCEJ 80th Annual Meeting (Tokyo, 2015)

List of received applications (By topics code)


11) Electronics

11-c. Micro-processing (Etching, Thin film, etc.)

Most recent update: 2015-07-10 15:24:01

The keywords that frequently used
in this toopics code.
KeywordsNumber
polymer1
electron beam resist1

ACKN
No.
Title/Author(s)KeywordsStyle
417Synthesis of new electron beam resist polymer and its supersensitivity
(Miyakonojo NCT) *Hirohama Syo, Iwakuma Minako, (Kumamoto U.) Kunitake Masashi, (Yamaguchi U.) Ikeda Shingo, Kishimura Yukiko, Asada Hironori, (gluon lab.) Hoshino Ryouici
electron beam resist
polymer
P

List of received applications (By topics code)

List of received applications
SCEJ 80th Annual Meeting (Tokyo, 2015)

(C) 2015 The Society of Chemical Engineers, Japan. The Society of Chemical Engineers, Japan. All rights reserved.
Most recent update: 2015-07-10 15:24:01
For more information contact Organizing Committee, SCEJ 80th Annual Meeting (Tokyo, 2015)
E-mail: inquiry-80awww3.scej.org
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