
$B:G=*99?7F|;~!'(B2016-05-19 11:21:01
$B$3$NJ,N`$G$h$/;H$o$l(B$B$F$$$k%-!<%o!<%I(B | $B%-!<%o!<%I(B | $B | |
|---|---|---|---|
| Oxide semiconductor | 1$B7o(B | ||
| Surfactant | 1$B7o(B | ||
| Coatings | 1$B7o(B | ||
| Drying | 1$B7o(B | ||
| Liquid penetration | 1$B7o(B | ||
| composite thin film | 1$B7o(B | ||
| Slurry-dried films | 1$B7o(B | ||
| Particles | 1$B7o(B | ||
| binary solvent | 1$B7o(B | ||
| Marangoni flow | 1$B7o(B | ||
| modified polyolefin | 1$B7o(B | ||
| mist deposition | 1$B7o(B | ||
| coating | 1$B7o(B | ||
| thermal dewetting | 1$B7o(B | ||
| Cu2O | 1$B7o(B | ||
| anti-fouling surface | 1$B7o(B | ||
| polypropylene | 1$B7o(B | ||
| Inkjet | 1$B7o(B | ||
| Metal nanoparticle | 1$B7o(B | ||
| spatial structure of nanoparticles | 1$B7o(B | ||
| Wettability of particulate films | 1$B7o(B | ||
| $B | $B9V1iBjL\!?H/I=| $B%-!<%o!<%I(B | $BH/I=7A<0(B | |
|---|---|---|---|
| 224 | $BJQ@-%]%j%*%l%U%#%s$H(BPEG$B7O4^%U%CAG9bJ,;R$rMQ$$$?%]%j%W%m%T%l%sI=LL=$>~K!$N3+H/(B | modified polyolefin anti-fouling surface polypropylene | P |
| 258 | $B9bJ,;R%3%s%]%8%C%HGvKl$NG.(Bdewetting$B5sF0$K5Z$\$9GvKlI=LL%J%NN3;R6E=89=B$$N1F6A(B | composite thin film spatial structure of nanoparticles thermal dewetting | P |
| 353 | $B4%Ag>r7o$,N3;RJ,;67OEII[Kl$N9=B$$K5Z$\$91F6A(B | Coatings Particles Drying | O |
| 535 | $B%P%s%/4pHD>eGvKl7A@.$K$*$1$k%^%i%s%4%KBPN.$N1F6A(B | coating Marangoni flow binary solvent | P |
| 754 | $B1U?;F)8=>]$rMxMQ$7$?%9%i%j! | Slurry-dried films Liquid penetration Wettability of particulate films | O |
| 848 | $B%&%(%C%H%W%m%;%9$K$h$k(BCu2O:p$B7?H>F3BNGvKl$N:n@=(B | Cu2O Oxide semiconductor mist deposition | O |
| 936 | $B3&LL3h@-:^$K$h$k6bB0%J%NN3;RG[@~$N:Y@~2=(B | Metal nanoparticle Surfactant Inkjet | P |
(C) 2016 $B8x1W
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