$B:G=*99?7F|;~!'(B2011-01-24 11:36:01
$B$3$NJ,N`$G$h$/;H$o$l(B $B$F$$$k%-!<%o!<%I(B | $B%-!<%o!<%I(B | $B | |
---|---|---|---|
film growth | 1$B7o(B | ||
ruthenium | 1$B7o(B | ||
barrier metal | 1$B7o(B | ||
chemical vapor deposition | 1$B7o(B | ||
electroless plating | 1$B7o(B | ||
titanium carbide | 1$B7o(B |
$B | $B9V1iBjL\!?H/I=$B%-!<%o!<%I(B | $B | |
---|---|---|---|
83 | Ti$B7O9E | chemical vapor deposition film growth titanium carbide | 12/2 19:50:16 |
125 | $BH>F3BN%P%j%"%a%?%k$NL5EE2r$a$C$-(B | barrier metal electroless plating ruthenium | 12/3 15:56:16 |