
$B:G=*99?7F|;~!'(B2011-01-24 11:36:01
$B$3$NJ,N`$G$h$/;H$o$l(B$B$F$$$k%-!<%o!<%I(B | $B%-!<%o!<%I(B | $B | |
|---|---|---|---|
| film growth | 1$B7o(B | ||
| ruthenium | 1$B7o(B | ||
| barrier metal | 1$B7o(B | ||
| chemical vapor deposition | 1$B7o(B | ||
| electroless plating | 1$B7o(B | ||
| titanium carbide | 1$B7o(B | ||
| $B | $B9V1iBjL\!?H/I=| $B%-!<%o!<%I(B | $B | |
|---|---|---|---|
| 83 | Ti$B7O9E | chemical vapor deposition film growth titanium carbide | 12/2 19:50:16 |
| 125 | $BH>F3BN%P%j%"%a%?%k$NL5EE2r$a$C$-(B | barrier metal electroless plating ruthenium | 12/3 15:56:16 |
(C) 2011 ($B
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