
$B:G=*99?7F|;~!'(B2012-02-09 18:59:01
$B$3$NJ,N`$G$h$/;H$o$l(B$B$F$$$k%-!<%o!<%I(B | $B%-!<%o!<%I(B | $B | |
|---|---|---|---|
| Thin film | 2$B7o(B | ||
| pulsed laser deposition | 1$B7o(B | ||
| $B | $B9V1iBjL\!?H/I=| $B%-!<%o!<%I(B | $B | |
|---|---|---|---|
| 76 | $BHs5.6bB0;@2=J*EE6K$rMQ$$$?6/M6EEBN%-%c%Q%7%?$N:n@=$HI>2A(B | ferroelectric material pulsed laser deposition conductive oxide | 12/2 01:29:36 |
| 104 | $B0[$J$kC:AG86NA$rMQ$$$?C:2=%A%?%sKl$NDc29$G$N:n@.$HI>2A(B | film growth chemical vapor deposition titanium carbide | 12/2 14:54:04 |
| 117 | $BD6NW3&Fs;@2=C:AG$rMQ$$$?J#9g;@2=J*GvKl$N:n@.$HH?1~5!9=2r@O(B | supercritical carbon dioxide thin film Bi$4$Ti$3$O$12$ | 12/2 16:06:31 |
| 136 | $B%J%NN3;R$K$h$k5$AjGvKl7A@.$K5Z$\$9BO@Q>r7o$N1F6A(B | Non-agglomerated nanoparticle Thin film Aerosol deposition | 12/5 13:23:38 |
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