
| Time | Paper ID | Title / Authors | Keywords | Topic code | Ack. number |
|---|---|---|---|---|---|
| Hall P | |||||
| (9:30–10:45) (Chair: No data ) | |||||
| P03 | Preparation of hollow silica nanoparticle using sugar nanoparticle as template | sugar silica hollow nanoparticle | 12-f | 81 | |
| P04 | Uptake of microspheres by microphages | Macrophages Microspheres Cellular Uptake | 12-a | 92 | |
| P05 | Composition of copper-doped borate glass and emission properties | glass copper borate | 12-k | 63 | |
| P06 | Surface modification of Er3+-doped LaOCl phosphors and emission properties | Upconversion Nanophosphors Surface modification | 12-a | 70 | |
| P07 | Optical properties of copper(µ)-doped SnO-ZnO-P2O5 glass and the structural change | glass phosphor emission properties | 12-k | 72 | |
| Break | |||||
| (11:00–12:15) (Chair: No data ) | |||||
| P09 | Dispersion of graphene in organic solvents using conductive organic polymer and its application to conductive materials | graphene conductive polymer dispersion | 12-a | 30 | |
| P10 | Development of pH-responsive supramolecular gelator | peptide lipid self-assembly pH-responsive | 12-e | 40 | |
| P11 | Display of carboxy groups on substrate surfaces by coating of fluorinated methacrylate-based polymers | polymer surface carboxy group segregation | 12-a | 119 | |
| P12 | Opal silicon film made by deposition of the bromosilane from the kerf-loss silicon | the kerf-loss silicon bromosilane opal silicon | 12-c | 14 | |
| P13 | Synthesis and properties of bisphenol B novolac resin as a photo-resist material (NIT or Nippon Inst. Tech. or NITechUC) *Nishimura Toshiyasu, | Bisphenol B Photo-resist Flexibility | 12-j | 16 | |
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