21st SCEJ Students Meeting in Kyoto (2019): Session programs

`21st SCEJ Students Meeting in Kyoto (2019)`

Session programs

Chemical reaction engineering, Electronics

N11-N16

Most recent update: 2019-02-18 13:09:45

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
Hall N
(13:00–14:12) (Chair: Gen Inoue, Keita Taniya)
13:00– 13:12	N11	Development and performance of micro channel distillation device (Kyoto U.) *Nishigaya Kosuke, Ono Shunsuke, Tamatsukuri Wataru, Muranaka Yosuke, Maki Taisuke, Mae Kazuhiro	micro channel distillation vapor-liquid equilibrium	5-f	116
13:12– 13:24	N12	Effects of steam on rate of carbon CVD from benzene (Kyoto U.) *Matsuda M., Makino Y., Kawase M.	CVD Carbon Steam	5-h	121
13:24– 13:36	N13	A gas-solid reaction model for rapid hydrogen removal utilizing copper oxide (Kyoto U.) *Sugaya T., Ashida R., (Toshiba ESS) Okabe H., Yamada A., (Kyoto U.) Kawase M.	Gas-solid reaction Copper oxide Hydrogen removal	5-e	126
13:36– 13:48	N14	Development of a new method of hard alumina coating from triethylaluminum (Kyoto U.) *Ogawa H., Nakamura T., Kawase M.	CVD Alumina coating Triethylaluminum	5-h	129
13:48– 14:00	N15	Low temperature growth of TiBC based thin films by RF plasma CVD (Osaka Pref. U.) *Fuji Kazuki, Kiyokawa Daichi, Okamoto Naoki, U. Osaka. Pref., Saito Takeyasu	RF plasma CVD hard coatings TiBCN	5-h	145
14:00– 14:12	N16	Synthesis of Conductive Film by Complexed Copper Particles (Hiroshima U.) *Iwamura Yuta, Yabuki Akihiro	Printable electronics Conductive film Copper particle	11-c	64

Technical program
21st SCEJ Students Meeting in Kyoto (2019)

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Most recent update: 2019-02-18 13:09:45
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