SCEJ

$B2=3X9)3X2q(B $BBh(B44$B2s=)5(Bg2q(B

$B9V1i%W%m%0%i%`!J2q>l!&F|DxJL!K(B

G$B2q>l(B $BBh(B3$BF|(B

$B:G=*99?7F|;~!'(B2012-08-20 15:02:17
$B9V1i(B
$B;~9o(B		$B9V1i(B
$BHV9f(B		$B9V1iBjL\!?H/I=$B%-!<%o!<%I(B$BJ,N`(B
$BHV9f(B		$B$BHV9f(B
$B%7%s%]%8%&%`(B $B!c(BCVD$B!&%I%i%$%W%m%;%9!!!]9=B$!&5!G=@)8f$NH?1~9)3X!]!d(B
(9:20$B!A(B10:40)$B!!(B($B:BD9(B $BLnED(B $BM%(B)
9:20$B!A(B 9:40G302$BD6NW3&N.BN$rMQ$$$?%J%N%$%s%W%j%s%HMQ(BNi$B%b!<%k%I:n@=%W%m%;%9$N3+H/(B
($BElBg1!9)(B) $B!{(B($B3X(B)$B@nED(B $B42?M(B $B!&(B ($B@5(B)$BI4@%(B $B7r(B $B!&(B ($B@5(B)$BAz3@(B $B9,9@(B
Supercritical Fluid Deposition
Ni
nano-imprint
S-8498
9:40$B!A(B 10:00G303$BD6NW3&Fs;@2=C:AG$rMQ$$$?(BTiO2$B!"(BBi2O3$BGvKl@.D9$NH?1~5!9=2r@O$HJ#9gKl2=(B
($B:eI\Bg1!9)(B) $B!{(B($B3X(B)$BCfED(B $B^+ $B!&(B ($B3X(B)$B>.Eg(B $B>O8w(B $B!&(B ($B@5(B)$B2,K\(B $B>0 $B!&(B ($B@5(B)$BsnF#(B $B>f{J(B $B!&(B ($B@5(B)$B6aF#(B $BOBIW(B $B!&(B ($BElKLBgB?858&(B) ($B@5(B)$B9b8+(B $B@?0l(B
supercritical carbon dioxide
thin film
deposition
S-8513
10:00$B!A(B 10:20G304$BD6NW3&(BCO2$B$rMQ$$$?(BTiO2$BGvKl@=KlMQA06nBN$NA*Br(B
($BElBg1!9)(B) $B!{(B($B3X(B)Zhao Yu $B!&(B ($B3X(B)Jung Kyubong $B!&(B ($B@5(B)Momose Takeshi $B!&(B ($B@5(B)Shimogaki Yukihiro
supercritical fluid deposition
thin film
titanium dioxide
S-8289
10:20$B!A(B 10:40G305[$B>7BT9V1i(B]$BM-5!J,;R=$>~;@2=J*%J%N7k>=$N9g@.!$=8@Q$H5!G=2=(B
($BElKLBgB?858&(B) $B!{(B($B@5(B)$B9b8+(B $B@?0l(B
oxide nanocrystals
surface modification
synthesis, integration, and functionalization
S-8283
(10:40$B!A(B12:00)$B!!(B($B:BD9(B $B?y;3(B $B@5OB(B)
10:40$B!A(B 11:00G306$BD6NW3&N.BN$rMQ$$$?%9%H%m%s%A%&%`%k%F%K%&%`;@2=Kl@=Kl%a%+%K%:%`(B
($BElBg1!9)(B) $B!{(B($B3X(B)$BE"(B $B7>J{(B $B!&(B ($B@5(B)$BI4@%(B $B7r(B $B!&(B ($B@5(B)$BAz3@(B $B9,9@(B
Supercritical Fluid Deposition
Strontium ruthenium oxide (SRO)
Deposition Mechanism
S-8277
11:00$B!A(B 11:20G307$BHs5.6bB0;@2=J*EE6K$K$h$k6/M6EEBN%-%c%Q%7%?$N0BDj@-I>2A(B
($B:eI\Bg1!9)(B) $B!{(B($B3X(B)$B|bED(B $B`v;R(B $B!&(B $BDT(B $BE0(B $B!&(B ($B@5(B)$B2,K\(B $B>0 $B!&(B ($B@5(B)$BsnF#(B $B>f{J(B $B!&(B ($B@5(B)$B6aF#(B $BOBIW(B $B!&(B $B5HB<(B $BIp(B $B!&(B $BF#B<(B $B5*J8(B $B!&(B ($B:eBg;:8&(B) $BHu8}(B $B9(Fs(B $B!&(B $BKLEg(B $B>4(B $B!&(B $BBgEg(B $BL@Gn(B
ferroelectric material
pulsed laser deposition
conductive oxide
S-8672
11:20$B!A(B 11:40G308$B%"%k%3%-%7%I86NA$rMQ$$$?%j%A%&%`;@2=J*GvKl$NG.(BCVD
($BEl3$Bg(B) $B!{(B($B3X(B)$BFsIS(B $BM32B(B $B!&(B ($B3X(B)$B;3M|(B $B??9-(B $B!&(B ($B@5(B)$B=);3(B $BBY?-(B
CVD
Lithium tert-butoxide
Lithium Oxide
S-8825
11:40$B!A(B 12:00G309ULSI-Cu$BG[@~MQ(BCo(W)$B%P%j%dKl7A@.(BCVD/ALD$B%W%m%;%9$N:GE,@_7W(B
($BElBg1!9)!&BgM[F|;@(B) $B!{(B($B@5(B)$B@6?e(B $B=(<#(B $B!&(B ($BElBg1!9)(B) ($B@5(B)$BI4@%(B $B7r(B $B!&(B ($B@5(B)$BAz3@(B $B9,9@(B
CVD
amidinate
alloy
S-892
(13:00$B!A(B14:20)$B!!(B($B:BD9(B $B?9(B $B?-2p(B)
13:00$B!A(B 13:40G313[$BE8K>9V1i(B] $B2=3XE*GmN%$*$h$S(BCVD$B$K$h$k%0%i%U%'%s$N@.Kl$HB@M[EECSMQF)L@F3EEKl$X$N1~MQ$HE8K>(B
($BIY;NEE5!(B) $B!{F#0f(B $B7r;V(B
Graphene
Transparent Conductive Film
CVD
S-8989
13:40$B!A(B 14:00G315$B6bB0%U%j!<%0%i%U%'%s$N4pHD>eD>@\7A@.$H9=B$@)8f(B
($BElBg1!9)(B) $B!{(B($B3X(B)$B>.:d(B $B>;51(B $B!&(B $B?785(B $B70(B $B!&(B ($B@5(B)$BLnED(B $BM%(B
graphene
patterned growth
metal-free
S-8210
14:00$B!A(B 14:20G316Cu-CVD$B%W%m%;%9$N=i4|3KH/@8!&@.D9$KBP$9$k2
($BElBg1!9)(B) $B!{(B($B3X(B)$BEh(B $B9IJ?(B $B!&(B ($B3X(B)$B@6?e(B $B=(<#(B $B!&(B ($B@5(B)$BI4@%(B $B7r(B $B!&(B ($B@5(B)$BAz3@(B $B9,9@(B
Cu-CVD
Nucleation
ULSI
S-8759
(14:20$B!A(B15:40)$B!!(B($B:BD9(B $B2O@%(B $B85L@(B)
14:20$B!A(B 14:40G317$BDc29$G$N%+!<%\%s%J%N%A%e!<%V$NcGL)9g@.(B
($BElBg1!9)(B) $B!{(B($B3X(B)$BMe(B $B%L%j(B $B!&(B ($B@5(B)$BLnED(B $BM%(B
carbon nanotubes
chemical vapor deposition
low temperature growth
S-8270
14:40$B!A(B 15:00G318[$B>7BT9V1i(B]$B%J%N%5%$%:J*
($B9-Bg1!9)(B) $B!{(B($B@5(B)$BEgED(B $B3X(B
nanomaterial
gas phase deposition
surface formation
S-8288
15:00$B!A(B 15:20G319$B4pHD>eC1AX%+!<%\%s%J%N%A%e!<%V!"%_%j%a!<%?!<%9%1!<%k@.D9$NI,MW>r7o$H9=B$@)8f(B
($BElBg1!9)(B) $B!{(B($B@5(B)$BD9C+@n(B $B3>(B $B!&(B ($B@5(B)$BLnED(B $BM%(B
single-walled carbon nanotube
chemical vapor deposition
rapid growth
S-8553
15:20$B!A(B 15:40G320Catalyst control for millimeter-tall single-walled carbon nanotubes with improved quality and areal density
($BElBg1!9)(B) $B!{(B($B3X(B)$BDD(B $BCiL@(B $B!&(B $B6b(B $BEl\F(B $B!&(B ($B@5(B)$BD9C+@n(B $B3>(B $B!&(B ($B@5(B)$BLnED(B $BM%(B
single walled carbon nanotubes
chemical vapor deposition
coarsening of catalyst
S-8258
$B9V1i%W%m%0%i%`(B
$B2=3X9)3X2q(B $BBh(B44$B2s=)5(Bg2q(B
(C) 2012 $B8x1W
Most recent update: 2012-08-20 15:02:17
For more information contact $B2=3X9)3X2qElKL;YIt(B $BBh(B44$B2s=)5(Bg2q(B $BLd$$9g$;78(B
E-mail: inquiry-44fwww3.scej.org
This page was generated by easp 2.28; proghtml 2.28c (C)1999-2011 kawase