The keywords that frequently used in this toopics code. | Keywords | Number | |
---|---|---|---|
electrodeposition | 3 | ||
Copper | 2 | ||
additive | 2 | ||
micro-contact printing | 1 |
ACKN No. | Title/Author(s) | Keywords | Style |
---|---|---|---|
17 | Low TEC Copper Electrodeposition | Copper Electrodeposition Thermal Expansion Coefficient | O |
23 | [Invited lecture] TSV solution in ULVAC | TSV Etcher Plasma | O |
25 | [Invited lecture] Monte Calro computation of via filling and additive by Copper electrodeposition | Monte Calro Copper electrodeposition Additive | O |
31 | [Invited lecture] Microvia and Through-Hole Filling by Electroplating for Electronic Circuit Fabrication | Copper Via additive | O |
107 | [Invited lecture] Device technology in Cognitive Computer System | デバイス CCS 半導体 | O |
217 | printed pattern of nucleating agent ink for electroless plating with micro-contact printing method | printed electronics Electrodeposition micro-contact printing | O |
340 | The modeling of TSV filling by using Monte Carlo Simulation | Monte Carlo Simulation Through-silicon via Additives | O |
402 | High-Speed Through Silicon Via (TSV) Filling | high speed TSV filling 3D packaging electrolyte optimization | O |
419 | Kinetic on Copper Damascene (Electroplating )and Cuprous Concentration Computation in the presence of Cl- and SPS | TSV filling Cuprous Copper plating kinetic | O |
736 | Electrodeposition simulation in the manufacturing process of electrolytic copper foil | electrodeposition simulation electrolytic copper foil | O |