SCEJ 47th Autumn Meeting (Sapporo, 2015): Hall and day program

`SCEJ 47th Autumn Meeting (Sapporo, 2015)`

Hall and day program

Hall O

Most recent update: 2015-08-26 10:00:42

Day 1
Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
SCEJ Division session SE-11. <Cutting Edge Technology for Transport Phenomena and Fluid Engineering>
(9:00–10:00) (Chair: Saeki T., Maekawa M.)
9:00– 9:20	O101	Study on energy transfer in two-dimensional turbulence (Kobe U.) *Murao I., Hidema R., Suzuki H., Komoda Y.	two-dimensional flow velocity field energy transfer	SE-11	730
9:20– 9:40	O102	Elastic instability of Hyaluronate solution analyzed by corner vortices in micro abrupt contraction-expansion channels (Kobe U.) *Hidema Ruri, Oka Taiki, Suzuki Hiroshi, Komoda Yoshiyuki	Elastic instability Hyaluronate solution	SE-11	657
9:40– 10:00	O103	Numerical analysis of pressure losses through the sudden contraction and expansion in a rectangular pipe with a bend (NIT Kagoshima) *Esaki Shuji, Shii Yasuyuki, (Kumamoto U.) Kawasaki Yutarou, (Globeride) Nakama Kakeru	Sudden Expansion Sudden Contraction Pressure Loss	SE-11	302
(10:00–11:00) (Chair: Suzuki H., Ookawara S.)
10:00– 10:20	O104	Visualization and modeling of drag-reducing flow caused by surfactant solutions (Yamaguchi U.) *Yamamoto Shunya, Shigemura Satoshi, Kobayashi Shuhei, Saeki Takashi	Drag Reduction Surfactant Flow Visualization	SE-11	839
10:20– 10:40	O105	Damping effects of surfactants on wind waves (Kyoto U.) *Kimura A., Miwa M., Takagaki N., Kurose R., Komori S.	Wave damping surfactant fluid	SE-11	102
10:40– 11:00	O106	PIV measurement of liquid flow formed through wire mesh and perforated plate (Fukuoka U.) *Uchiyama Hiroki, Morita Jun, Sato Ryouta, Matsukuma Yosuke, Ide Mitsuharu	PIV Hot film anemometer Flow visualization	SE-11	911
(11:00–12:00) (Chair: Komori S., Maekawa M.)
11:00– 11:20	O107	Numerical Simulation of Rayleigh-Taylor Instability with Front-Tracking Method (Saitama U.) *Nakajima Ryota, Homma Shunji, Koga Jiro	Rayleigh-Taylor Instability Front-Tracking Method Numerical simulation	SE-11	396
11:20– 11:40	O108	Numerical analysis on infiltration speed into porous medium of glass beads (Fukuoka U.) *Kubokawa Y., Tsuchida M., Uchiyama H., Matsukuma Y.	packed bed penetration Lattice Boltzmann method	SE-11	138
11:40– 12:00	O109	The flow visualization and the velocity measurement of the Marangoni convection induced on a gas-liquid free interface in a capillary channel (Shibaura Inst. Tech.) *Yamada Takashi, Nakamura Hitoshi, Shimano Daiki, Ono Naoki	Marangoni effect PIV Capillary channel	SE-11	723
(13:00–13:40) (Chair: Iwata S.)
13:00– 13:40	O113	[Invited lecture] Development of Ultrasound Doppler Rheometry (Hokkaido U.) *Murai Y., Tasaka Y., Shiratori T.	Ultrasound Doppler Rheometry	SE-11	30
(13:40–14:20) (Chair: Taniguchi T.)
13:40– 14:20	O115	[Invited lecture] Three-dimensional structures of immiscible polymer blends and rheology in shear flow and electric fields (Hokkaido U.) Orihara Hiroshi	Immiscible polymer blend Three-dimensional structure Rheology	SE-11	88
(14:20–15:00) (Chair: Ookawara S., Maekawa M.)
14:20– 14:40	O117	Rheological property of aromatic amide organogelator; PMDAs and their stabilization effects for particle-oil suspensions (Yamaguchi U.) *Arita Taisuke, Itoh Mami, Saeki Takashi, (Daicel) Sakanishi Yuichi, (Cosmo oil lubricants) Terauchi Ryuji, Tochigi Hiroshi, Watanabe Yoshihisa	Organogelator Rheology Stability	SE-11	856
14:40– 15:00	O118	Improvement of pressure oscillating method for the continuous pressure-oscillating defoaming (NITech) *Mizukoshi A., Iwata S., Mori H., Nagumo R.	defoaming pressure-oscillation shear-thinning fluid	SE-11	463
(15:00–16:00) (Chair: Matsukuma Y., Ookawara S.)
15:00– 15:20	O119	Numerical simulation of melting behavior by a Lagrangian approach (U. Tokyo) *Takabatake Kazuya, Sun Xiaosong, Sakai Mikio	MPS phase transition heat transfer	SE-11	612
15:20– 15:40	O120	The relative contributions of thermal and solutal Marangoni convections on flow patterns in a liquid bridge (U. Ryukyus) *Minakuchi H., Nishime K., Yoshino T., (Osaka U.) Okano Y.	Marangoni convection Floating zone technique Si/Ge	SE-11	617
15:40– 16:00	O121	Development of a new contact model for adhesive particles in the discrete particle simulation (U. Tokyo) *Basinskas G., Sakai M.	adhesive contact model discrete element method	SE-11	118
(16:00–17:00) (Chair: Minakuchi H., Maekawa M.)
16:00– 16:20	O122	Numerical Simulation of Gas-Liquid Two Phase Flow in Rectangular Container with Aeration (Okayama U. Sci.) *Yamaguchi Taichi, Hirano Hiroyuki, Kuwagi Kenya	Gas-Liquid flow Two Phase Flow Numerical Simulation	SE-11	832
16:20– 16:40	O123	Characteristics of thermal engineering and distillation of energy-saving distillation system without mechanical compression work (Kansai Chemical Eng.) *Kataoka Kunio, Noda Hideo, Mukaida Tadahiro, Nishimura Goro, Yamaji Hiroshi	HIDiC Energy conservation Ethanol distillation	SE-11	319
16:40– 17:00	O124	Separation and Classification of coarse particle by spiral mini-channel (Tokyo Tech) *Kanashiro Syota, Ookawara Shinichi, Yoshikawa Shiro	Coarse particle separation/classification Spiral mini-channel CFD	SE-11	491
Day 2
Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
SCEJ Division Symposium SY-2. <The Subjects and Approaches to Process Safety Management>
(9:20–10:40) (Chair: Takeda K.)
9:20– 9:40	O202	Activity Report of Safety Division (Tokyo Tech) Fuchino Tetsuo	Process Safety Management Lifecycle Safety Research Theme	SY-2	91
9:40– 10:00	O203	Development of metrics (Ritsumeikan U. MOT) Aoyama Atsushi	Process Safety Management Lagging Metrics	SY-2	674
10:00– 10:20	O204	Summary of Plant Maintenance WG Technical Report (Tokyo Tech) Fuchino Tetsuo	Plant Maintenance Business Process Model Technology Requirement Specification	SY-2	92
10:20– 10:40	O205	Process Chemistry Linked with Process/Plant Design Engineering (TUAT) Kitajima Teiji	Process Chemistry Process/Plant Design Engineering Business Process Model	SY-2	423
(10:40–12:00) (Chair: Aoyama A.)
10:40– 11:00	O206	Management of Process Safety Information (JNIOSH) Shimada Yukiyasu	Process Safety Information Process Safety Management Plant Lifecycle	SY-2	196
11:00– 11:20	O207	Research Plan of WG on Guidelines for Incident Investigation (Tokyo Tech) Fuchino Tetsuo	Incident Investigation Process Hazard Analysis Lifecycle Engineering	SY-2	183
11:20– 11:40	O208	Safety Culture in the Investigation Reports of Chemical Industry Accidents (Keio SDM) Uno Kenichi	Safety Culture Chemical Industry Accident	SY-2	314
11:40– 12:00	O209	Spreading of Nontechnical skill education (SCEJ) Minamigawa Tadao	Process Safety	SY-2	45
SCEJ Division Symposium SY-9. <CVD & Dry Processes - Reaction Engineering for Controlling Microstructure and Functions>
(13:00–14:00) (Chair: Tamaoki N.)
13:00– 13:40	O213	[Review lecture] Review of process technologies for 3D memories integration (Toshiba) Hattori Kei	semiconductor fabrication process technology 3D memory	SY-9	129
13:40– 14:00	O215	Effects of supersaturation and solubility difference on anthracene film fabrication using temperature gradient in supercritical solution (U. Tokyo) *Toyokura Shota, Shimoyama Yusuke, Shimogaki Yukihiro, Momose Takeshi	Supercritical CO2 anthracene crystallization	SY-9	156
(14:00–15:00) (Chair: Kawase M.)
14:00– 14:20	O216	Kinetics of conformal TiO₂ deposition in supercritical CO₂ with various pressures (U. Tokyo) *Zhao Yu, Momose Takeshi, Shimoyama Yusuke, Shimogaki Yukihiro	supercritical fluid deposition pressure kinetics	SY-9	543
14:20– 14:40	O217	Production of thin films of TIPS-pentacene by rapid expansion of supercritical solutions (RESS) using carbon dioxide and performance evaluation of the organic thin film transistor (Shinshu U.) *Natsume M., Takahashi Y., Fujii T., Uchida H.	Supercritical carbon dioxide TIPS-pentacene thin films Organic thin film transistor (OTFT)	SY-9	668
14:40– 15:00	O218	Formation of iron oxide thin film using supercritical CO₂ (Osaka Pref. U.) *Sumi Y., Tone M., Okamoto N., Saito T., Kondo K., (Tohoku U.) Takami S.	supercritical CO2 FeRAM iron oxide	SY-9	758
(15:00–16:00) (Chair: Shimoyama Y.)
15:00– 15:20	O219	[Invited lecture] High pressure spray deposition technology with lowered viscosity by CO₂ addition (RISPT, AIST) *Kawasaki Shin-ichiro, (Tohoku U.) Suzuki Akira	high pressure carbon dioxide spray deposition viscosity	SY-9	131
15:20– 15:40	O220	CuInS₂ deposition into nanoporous TiO₂ by using supercritical fluid (IMRAM, Tohoku U.) *Yasui Yoji, Nakayasu Yuta, (U. Tokyo) Momose Takeshi, (IMRAM, Tohoku U.) Tomai Takaaki, Honma Itaru	supercritical fluid deposition nanostructure compound semiconductor	SY-9	442
15:40– 16:00	O221	Silica-based gas barrier films prepared by plasma CVD and measurement of gas permeation rate (Kyoto U.) *Ohtsu H., Takeda E., Kawase M.	plasma CVD silica-based film gas barrier	SY-9	757
(16:00–17:00) (Chair: Habuka H.)
16:00– 16:20	O222	Chemical structure and properties of silica film prepared by plasma CVD (Kyoto U.) *Takeda E., Deguchi T., Ohtsu H., Kawase M.	plasma CVD chemical structure film properties	SY-9	815
16:20– 16:40	O223	Characterization of carbon nanowalls synthesized by PECVD using different carbon sources (Tokyo Tech) *Shinkawa Hiroki, Mori Shinsuke	carbon nanowall carbon monoxide	SY-9	897
16:40– 17:00	O224	Practical chemical vapor deposition of graphene: Feed modulation for large-grain, high coverage graphene films in shorter CVD time (Waseda U.) *Okawa Asahi, Hasegawa Kei, Noda Suguru	Graphene Chemical vapor deposition Nucleation and growth	SY-9	605
Day 3
Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
SCEJ Division Symposium SY-9. <CVD & Dry Processes - Reaction Engineering for Controlling Microstructure and Functions>
(9:00–10:00) (Chair: Ikeda K.)
9:00– 9:20	O301	Improved methodology to evaluate reactivity of deposition species within fine trenches (U. Tokyo) *Funato Y., Shima K., Sato N., Sugiura H., Nakahara T., (IHI) Fukushima Y., (U. Tokyo) Momose T., Shimogaki Y.	reactivity analysis fine trench Chemical Vapor Deposition	SY-9	861
9:20– 9:40	O302	Modeling of chemical vapor infiltration using ultra high aspect-ratio microcavity (U. Tokyo) *Shima K., Sato N., Funato Y., Sugiura H., Nakahara T., (IHI) Fukushima Y., (U. Tokyo) Momose T., Shimogaki Y.	CVD SiC methyltrichlorosilane	SY-9	747
9:40– 10:00	O303	Effects of reactant hydrocarbons and substrate metals on CVD rate of pyrolytic carbon (Kyoto U.) *Baba S., Iwai T., Nagata K., Kawase M.	CVD Pyrolysis Carbon	SY-9	278
(10:00–11:00) (Chair: Mori S.)
10:00– 10:20	O304	Transient simulation for CVD process using alternative gases (Athenasys) Ikeda K.	CVD ALD simulation	SY-9	608
10:20– 10:40	O305	By-product Formation in a SiHCl₃-H₂ System for Silicon Film Deposition (Yokohama Nat. U.) Sakurai Ayumi, Saito Ayumi, *Habuka Hitoshi	Silicon epitaxial growth trichlorosilane by-products	SY-9	11
10:40– 11:00	O306	Construction of reaction mechanism of formation of deposit in exhaust of Si-Cl compounds CVD reactor (U. Tokyo) *Sato N., Shima K., Funato Y., Sugiura H., Nakahara T., (IHI) Fukushima Y., (U. Tokyo) Momose T., (NIAD-UE) Koshi M., (U. Tokyo) Shimogaki Y.	silicon-chlorine compounds by-products elementary reaction simulation	SY-9	840
(11:00–12:00) (Chair: Shimogaki Y.)
11:00– 11:20	O307	Analysis of sublimation purification process of organic semiconductor materials (U. Tokyo) *Iwao Takuya, Yamaguchi Yukio, Tsuji Yoshiko	sublimation purification organic semiconductors	SY-9	468
11:20– 11:40	O308	Preparation of Ag-TiO₂ composite films with nanoparticle codeposition by a gas phase method (Hiroshima U.) *Masuda H., Tai Y., Kubo M., Shimada M.	PECVD Nanoparticle synthesis PVD	SY-9	273
11:40– 12:00	O309	[Invited lecture] Design, synthesis and ALD assessment of organometallic precursors for semiconductor applications (Air Liquide) Dussarrat Christian	atomic layer deposition conformal growth reaction mechanism	SY-9	132
(13:00–14:00) (Chair: Noda S.)
13:00– 13:40	O313	[Invited lecture] Heteroepitaxial growth and of compound semiconductor nanowire (RCIQE, Hokkaido U.) *Tomioka Katsuhiro, Motohisa Junichi, Fukui Takashi	compound semiconductor nanowire heteroepitaxial growth	SY-9	128
13:40– 14:00	O315	Properties of zinc oxide thin films synthesized by CVD method. (Tokai U.) *Kuroda Shingo, Kubo Fumika, Yokoyama Yuki, Watanabe Masatoshi, Okubo Tatsuo, Akiyama Yasunobu	CVD Zinc oxide transparent conductive film	SY-9	767
(14:00–15:00) (Chair: Akiyama Y.)
14:00– 14:20	O316	Electrical properties of ferroelectric capacitors with conductive oxide electrodes fabricated under different oxygen pressure (Osaka Pref. U.) *Takada Y., Amano T., Okamoto N., Saito T., Kondo K., Yoshimura T., Fujimura N., (Osaka U.) Higuchi K., Kitajima A.	Ferroelectric capacitor pulsed laser deposition oxygen pressure	SY-9	645
14:20– 14:40	O317	Contact resistance evaluation of electron beam evaporated Ti compound/Pt/Au electrode on p-type diamond by transmission line model (Osaka Pref. U.) *Suzuki S., Okamoto N., Saito T., Kondo K., (AIST) Matsumoto T., Makino T., Ogura M., Kato H., Takeuchi D., Yamasaki S., Okushi H.	diamond contact resistance electron beam evaporated	SY-9	787
14:40– 15:00	O318	[Review lecture] Structural control and radical enhanced low temperature growth of nitride thin film (Kitami Inst. Tech.) *Takeyama Mayumi, Sato Masaru, Noya Atsushi	nitride thin film sputtering radical nitridization	SY-9	130
(15:00–15:40) (Chair: Saito T.)
15:00– 15:20	O319	Fabrication of large-grain crystalline Si thin films by rapid vapor deposition with in situ melt-crystallization (Waseda U.) *Yamasaki Yuhei, Hasegawa Kei, Osawa Toshio, Noda Suguru	crystalline silicon thin films vapor deposition liquid phase crystallization	SY-9	643
15:20– 15:40	O320	Crystal orientation control of CVD-coated Al₂O₃ layer (U. Tokyo) *Nishizawa Kei, Momose Takeshi, (Kyocera) Tanibuchi Takahito, (U. Tokyo) Shimogaki Yukihiro	CVD Al2O3 crystal-orientation	SY-9	827

Technical program
SCEJ 47th Autumn Meeting (Sapporo, 2015)

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Most recent update: 2015-08-26 10:00:42
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