SCEJ 47th Autumn Meeting (Sapporo, 2015): Hall and day program

`SCEJ 47th Autumn Meeting (Sapporo, 2015)`

Hall and day program

Hall O, Day 2

Most recent update: 2015-08-26 10:00:42

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
SCEJ Division Symposium SY-2. <The Subjects and Approaches to Process Safety Management>
(9:20–10:40) (Chair: Takeda K.)
9:20– 9:40	O202	Activity Report of Safety Division (Tokyo Tech) Fuchino Tetsuo	Process Safety Management Lifecycle Safety Research Theme	SY-2	91
9:40– 10:00	O203	Development of metrics (Ritsumeikan U. MOT) Aoyama Atsushi	Process Safety Management Lagging Metrics	SY-2	674
10:00– 10:20	O204	Summary of Plant Maintenance WG Technical Report (Tokyo Tech) Fuchino Tetsuo	Plant Maintenance Business Process Model Technology Requirement Specification	SY-2	92
10:20– 10:40	O205	Process Chemistry Linked with Process/Plant Design Engineering (TUAT) Kitajima Teiji	Process Chemistry Process/Plant Design Engineering Business Process Model	SY-2	423
(10:40–12:00) (Chair: Aoyama A.)
10:40– 11:00	O206	Management of Process Safety Information (JNIOSH) Shimada Yukiyasu	Process Safety Information Process Safety Management Plant Lifecycle	SY-2	196
11:00– 11:20	O207	Research Plan of WG on Guidelines for Incident Investigation (Tokyo Tech) Fuchino Tetsuo	Incident Investigation Process Hazard Analysis Lifecycle Engineering	SY-2	183
11:20– 11:40	O208	Safety Culture in the Investigation Reports of Chemical Industry Accidents (Keio SDM) Uno Kenichi	Safety Culture Chemical Industry Accident	SY-2	314
11:40– 12:00	O209	Spreading of Nontechnical skill education (SCEJ) Minamigawa Tadao	Process Safety	SY-2	45
SCEJ Division Symposium SY-9. <CVD & Dry Processes - Reaction Engineering for Controlling Microstructure and Functions>
(13:00–14:00) (Chair: Tamaoki N.)
13:00– 13:40	O213	[Review lecture] Review of process technologies for 3D memories integration (Toshiba) Hattori Kei	semiconductor fabrication process technology 3D memory	SY-9	129
13:40– 14:00	O215	Effects of supersaturation and solubility difference on anthracene film fabrication using temperature gradient in supercritical solution (U. Tokyo) *Toyokura Shota, Shimoyama Yusuke, Shimogaki Yukihiro, Momose Takeshi	Supercritical CO2 anthracene crystallization	SY-9	156
(14:00–15:00) (Chair: Kawase M.)
14:00– 14:20	O216	Kinetics of conformal TiO₂ deposition in supercritical CO₂ with various pressures (U. Tokyo) *Zhao Yu, Momose Takeshi, Shimoyama Yusuke, Shimogaki Yukihiro	supercritical fluid deposition pressure kinetics	SY-9	543
14:20– 14:40	O217	Production of thin films of TIPS-pentacene by rapid expansion of supercritical solutions (RESS) using carbon dioxide and performance evaluation of the organic thin film transistor (Shinshu U.) *Natsume M., Takahashi Y., Fujii T., Uchida H.	Supercritical carbon dioxide TIPS-pentacene thin films Organic thin film transistor (OTFT)	SY-9	668
14:40– 15:00	O218	Formation of iron oxide thin film using supercritical CO₂ (Osaka Pref. U.) *Sumi Y., Tone M., Okamoto N., Saito T., Kondo K., (Tohoku U.) Takami S.	supercritical CO2 FeRAM iron oxide	SY-9	758
(15:00–16:00) (Chair: Shimoyama Y.)
15:00– 15:20	O219	[Invited lecture] High pressure spray deposition technology with lowered viscosity by CO₂ addition (RISPT, AIST) *Kawasaki Shin-ichiro, (Tohoku U.) Suzuki Akira	high pressure carbon dioxide spray deposition viscosity	SY-9	131
15:20– 15:40	O220	CuInS₂ deposition into nanoporous TiO₂ by using supercritical fluid (IMRAM, Tohoku U.) *Yasui Yoji, Nakayasu Yuta, (U. Tokyo) Momose Takeshi, (IMRAM, Tohoku U.) Tomai Takaaki, Honma Itaru	supercritical fluid deposition nanostructure compound semiconductor	SY-9	442
15:40– 16:00	O221	Silica-based gas barrier films prepared by plasma CVD and measurement of gas permeation rate (Kyoto U.) *Ohtsu H., Takeda E., Kawase M.	plasma CVD silica-based film gas barrier	SY-9	757
(16:00–17:00) (Chair: Habuka H.)
16:00– 16:20	O222	Chemical structure and properties of silica film prepared by plasma CVD (Kyoto U.) *Takeda E., Deguchi T., Ohtsu H., Kawase M.	plasma CVD chemical structure film properties	SY-9	815
16:20– 16:40	O223	Characterization of carbon nanowalls synthesized by PECVD using different carbon sources (Tokyo Tech) *Shinkawa Hiroki, Mori Shinsuke	carbon nanowall carbon monoxide	SY-9	897
16:40– 17:00	O224	Practical chemical vapor deposition of graphene: Feed modulation for large-grain, high coverage graphene films in shorter CVD time (Waseda U.) *Okawa Asahi, Hasegawa Kei, Noda Suguru	Graphene Chemical vapor deposition Nucleation and growth	SY-9	605

Technical program
SCEJ 47th Autumn Meeting (Sapporo, 2015)

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Most recent update: 2015-08-26 10:00:42
For more information contact Organizing Committee, SCEJ 47th Autumn Meeting (Sapporo, 2015)
E-mail: inquiry-47f

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