SCEJSCEJ SCEJ 52nd Autumn Meeting Sep. 22 (Wed) - Sep. 24 (Fri), 2021 Okayama University, Tsushima Campus Japanese page
Last Update: 2022-09-26 18:24:00

List of received applications (By topics code)


ST) SCEJ Trans-Division Symposium

ST-22. [Trans-Division Symposium] CVD and Dry Processes

Organizer(s): Kawase Motoaki (Kyoto Univ.), Tamaoki Naoki (Kioxia), Saito Takeyasu (Osaka Pref. Univ.), Miyake Masato (NAIST)

CVD and other dry processes are core technology in the industry applications for solar cell, electronics devices, MEMS, and functional coatings. This symposium motivates to discuss the logical optimization and design for controlling the microstructure and functions of thin films and fine particles produced by CVD, ALD or other dry processes based on the theoretical understanding of reaction mechanisms. Young Researcher Award will be given to distinguished young speakers chosen at the session.

Most recent update: 2022-01-31 16:50:01

The keywords that frequently used
in this topics code.
KeywordsNumber
CVD5*
CVI2
Numerical simulation2
Chemical Vapor Deposition2
thermal annealing1

ACKN
No.
Title/Author(s)KeywordsStyle
40Si-B film deposition from boron trichloride and monomethylsilane gases
(Yokohama Nat. U.) Muroi Mitsuko, *(Reg)Habuka Hitoshi
Chemical vapor deposition
Silicon-Boron film
Mechanism
O
142Effect of additives on photocatalysis and crystallinity of TiO2 made by supercritical fluid deposition
(U. Tokyo) *(Stu)Aji Ryosuke, (Reg)Deura Momoko, (Tokyo Tech) (Reg)Shimoyama Yusuke, (U. Tokyo) (Reg)Shimogaki Yukihiro, (Reg)Momose Takeshi
supercritical fluid deposition
photocatalyst
crystallinity
O
154One-step fabrication of CuO-loaded TiO2 nanoparticulate thin film for photocatalytic application under visible light irradiation
(Hiroshima U.) *(Stu)Hudandini Meditha, Jiang Dianping, (ITS, Indonesia) Kusdianto K., (Hiroshima U.) (Reg)Kubo Masaru, (Reg)Shimada Manabu
PECVD-PVD
nanocomposite
heterojunction
O
375Process development of bismuth-based perovskite CVD for solar cells
(Kyoto U.) *(Stu)Togami Keito, (Stu)Matsuda Megumi, Yang Ziguang, (Reg)Kawase Motoaki
CVD
perovskite
methylammonium bismuth iodide
O
514[Review lecture] Growth control of nano-particles in reactive plasmas and its applications
(Kyushu U.) Koga Kazunori
CVD
nano-particles
growth control
O
516[Invited lecture] Control of physical properties of CNT yarns spun directly from tall and dense CNT arrays and their application to energy and mechanical devices
(Okayama U.) Hayashi Yasuhiko
Carbon nanotube (CNT) arrays
Dry Spinning CNT yarns
Energy and mechanical devices
O
517[Review lecture] Semiconductor Memories: Technology, Economy, Industry and Future Growth
(Micron Memory Japan) Aoto Nahomi
CVD
semiconductor memory
industry
O
519[Invited lecture] Challenge to simulation of microspace and macrotime structural changes under plasma irradiation
(Nat. I. Fusion Sci.) Ito Atsushi
CVD
plasma
numerical simulation
O
562Numerical simulation of the CVI process in a ceramic matrix composites manufacturing reactor
(Nagoya U.) *(Stu)Ogawa Tatsuya, (Reg)Fukumoto Kazui, (Reg)Machida Hiroshi, (Reg)Norinaga Koyo
CVI
Numerical simulation
MTS
O
594Examination of precursor vaporization characteristics in pulse-supply ALD
(U. Tokyo) *(Stu)Yamaguchi Jun, (Reg)Deura Momoko, (Reg)Momose Takeshi, (Daikin Industries) (Cor)Matsunaga Takayuki, (Cor)Yamauchi Akiyoshi, (Cor)Kishikawa Yousuke, (U. Tokyo) (Reg)Shimogaki Yukihiro
ALD
precursor
vaporization
O
629Direct synthesis of organic modified iron oxide nanocrystals using supercritical CO2 as a reaction field
(Tokyo Tech) *(Reg)Orita Yasuhiko, Kariya Keito, (Stu)Wijakmatee Thossaporn, (Reg)Shimoyama Yusuke
Supercritical carbon dioxide
iron oxide nanocrystals
organic modification
O
672Enhanced CO2-assisted growth of single-wall carbon nanotube arrays with Fe/AlOx catalyst annealed without CO2
(Waseda U.) *(Reg)Li Mochen, (Stu)Yasui Kotaro, (Kindai U.) (Reg)Sugime Hisashi, (Waseda U.) (Reg)Noda Suguru
chemical vaper deposition
thermal annealing
single-wall carbon nanotubes
O
689SiC Infiltration Process Including Exhaust Gas Recycling for SiCf/SiC CMC
(U. Tokyo) *(Stu)Otaka Yuhei, (Reg)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
SiC
reuse
CVI
O
785Construction of gas-phase elementary reaction mechanism of TiAlN-CVD based on theoretical study
(U. Tokyo) *(Reg)Sato Noboru, (Stu)Yamaguchi Jun, (Kyocera) (Cor)Kubo Hayato, (Cor)Sugiyama Takanori, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Kyocera) (Cor)Tanibuchi Takahito, (U. Tokyo) (Reg)Shimogaki Yukihiro
TiAlN
CVD
Elementary reaction model
O
792Development and validation of overall reaction model for polycrystalline SiC-CVD process design
(U. Tokyo) *(Stu)Moroi K., (Stu)Oku T., (Reg)Deura M., (Reg)Momose T., (Reg)Shimogaki Y.
Chemical Vapor Deposition
silicon carbide
macrocavity method
O
863Preparation of TiCN thin film with Ti[N(CH3)2]4 by PACVD
(Osaka Pref. U.) *(Stu)Takeuchi Riku, (Reg)Okamoto Naoki, (Reg)Saito Takeyasu
plasma CVD
TDMAT
TiCN
O
864Deposition and evaluation of Max Compounds as wiring materials for next-generation semiconductors
(Osaka Pref. U.) *(Stu)Wakamatsu Kazunobu, Ueda Kazuki, (Reg)Okamoto Naoki, (Reg)Saito Takeyasu
Max Phase
semiconductor
O

List of received applications (By topics code)

List of received applications

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