SCEJ 81st Annual Meeting (2016): List of the applications (topics)

`SCEJ 81st Annual Meeting (2016)`

List of received applications (By topics code)

5) Chemical reaction engineering

5-h. CVD & dry processes

Most recent update: 2016-05-19 11:21:01

The keywords that frequently used in this topics code.	Keywords	Number
	chemical vapor deposition	9
	carbon nanotubes	8
	graphene	5
	CVD	5
	fluidized bed	3
	SiC	3
	crystal growth	3
	methyltrichlorosilane	2
	flame synthesis	2
	single-wall carbon nanotubes	2
	dry-etching	2
	aerosol catalysts	2
	PZT capacitors	1

ACKN No.	Title/Author(s)	Keywords	Style
123	Continuous gas-phase production of hybrid carbon nanoparticles with nanotubes (Waseda U.) *(Stu)Kuriya Masaaki, (Ful)Hasegawa Kei, (Ful)Osawa Toshio, (Ful)Noda Suguru	carbon nanotubes carbon nanoparticles continuous production	P
180	Direct synthesis of graphene on SiO₂ by dissolving carbon to and Cl₂ etching of Co films (Waseda U.) *(Stu)Kishida Yuri, (Ful)Hasegawa Kei, (Ful)Noda Suguru	graphene crystal growth dry-etching	P
216	Rapid vapor deposition and mechanical separation of large-grain crystalline Si thin films on/from graphitic substrates (Waseda U.) *(Stu)Yamasaki Yuhei, (Ful)Hasegawa Kei, (Ful)Osawa Toshio, (Ful)Noda Suguru	crystalline silicon thin films lift-off process crystal growth	P
273	Flame synthesis of single-wall carbon nanotubes and reaction field control for their quality improvement (Waseda U.) *(Stu)Okada Shohei, (Ful)Hasegawa Kei, (Ful)Osawa Toshio, (Ful)Noda Suguru	single-wall carbon nanotubes flame synthesis reaction field control	P
334	Controlled formation of graphene using epitaxial Cu film catalyst rapidly deposited on sapphire substrates (Waseda U.) *(Stu)Minamide Taisuke, (Stu)Aoi Shigeki, Okawa Asahi, (Ful)Hasegawa Kei, (Ful)Noda Suguru	graphene chemical vapor deposition epitaxial growth	P
338	Direct growth and structural control of graphene films on dielectric substrates by "etching-precipitation" method (Waseda U.) *(Stu)Akiba Sachie, (U. Tokyo) Kosaka Masaki, (Waseda U.) (Ful)Hasegawa Kei, (Ful)Noda Suguru	graphene crystal growth dry-etching	P
349	Synthesis of graphene on Cu foils from CH₄ and CO and mechanism analysis based on rate process and equilibrium (Waseda U.) *(Stu)Nagai Yukuya, Okawa Asahi, (Ful)Hasegawa Kei, (Ful)Noda Suguru	graphene chemical vapor deposition disproportionation reaction	P
358	Tailor made fabrication of carbon nanotube structures on three-dimensional aluminum substrates (Waseda U.) *(Stu)Yoshihara Yu, (Ful)Hasegawa Kei, (DENSO CORP. Res. Labs.) Ooshima Hisayoshi, (Waseda U.) (Ful)Noda Suguru	carbon nanotubes aluminum substrates three-dimensional structure	P
402	Roles of pre-anneal treatment for graphene CVD growth (Fukuoka U.) Ueno M., (Ful)Yoshihara N., (Ful)Noda M.	graphene pre-anneal chemical vapor deposition	O
468	Fluidized bed production of carbon nanotubes using gas-phase supported catalyst on ceramic powders (Waseda U.) *(Stu)Kawabata Kosuke, (Ful)Hasegawa Kei, (Ful)Osawa Toshio, (Ful)Noda Suguru	carbon nanotubes fluidized bed chemical vapor deposition	P
477	Fluidized bed production of single-wall carbon nanotubes using carefully sputtered catalyst on beads (Waseda U.) *(Stu)Hachiya Soichiro, Chen Zhongming, (Stu)Kawabata Kosuke, (Ful)Hasegawa Kei, (Ful)Osawa Toshio, (Ful)Noda Suguru	single-wall carbon nanotubes fluidized bed chemical vapor deposition	P
628	A study of deposition suppression on side-walls in vertical rotating disk reactor (Toyota Central R&D Labs., Inc.) *(Ful)Makino Soichiro, (Cor)Nakashima Kenji, (Cor)Inagaki Masahide, (Ful)Kozawa Takahiro, (Cor)Horinouchi Nariaki	CVD CFD deposition	O
739	Continuous production of carbon nanotubes by feeding supported catalysts to the gas flow (Waseda U.) *(Stu)Oba Ittetsu, (Ful)Hasegawa Kei, (Ful)Osawa Toshio, (Hodogaya chemical) Tsukada Takayuki, (Waseda U.) (Ful)Noda Suguru	carbon nanotubes aerosol catalysts chemical vapor deposition	P
762	Structure formation of composite thin films by vapor/solid-precursor PECVD (Hiroshima U.) (Ful)Kubo Masaru, (Ful)Shimada Manabu, (Stu·PCEF)Taguchi Tomoya	composite material plasma synthesis aerosol nanoparticle deposition	O
800	Process development for highly conformal filling of SiC-CVI using a sacrificial layer (U. Tokyo) *(Stu)Shima K., (Stu)Sato N., (Stu)Funato Y., (IHI) (Ful)Fukushima Y., (U. Tokyo) (Ful)Momose T., (Ful)Shimogaki Y.	CVD SiC methyltrichlorosilane	O
812	Effect of temperature and pressure on SiC-CVI using ultra high aspect ratio features (U. Tokyo) *(Stu)Shima K., (Stu)Sato N., (Stu)Funato Y., (IHI) (Ful)Fukushima Y., (U. Tokyo) (Ful)Momose T., (Ful)Shimogaki Y.	CVD SiC methyltrichlorosilane	O
817	Flame synthesis of carbon nanotube (CNT) through diesel engine using floating catalysts (Tokyo Tech) *(Stu)Suzuki S., (Ful)Mori S.	Carbon nanotube flame synthesis diesel	P
883	Gas-phase continuous production of carbon nanotubes of smaller diameters at higher yields (Waseda U.) *(Ful)Noda Suguru, Yamaguchi Mai, (Stu)Okada Shohei, (Stu)Oba Ittetsu, (Stu)Sugino Yusuke, (Stu)Kuriya Masaaki, (Ful)Hasegawa Kei, (Ful)Osawa Toshio	carbon nanotubes chemical vapor deposition aerosol catalysts	O
886	On-substrate synthesis of carbon nanotubes for device applications (Waseda U.) *(Ful)Noda Suguru, (U. Tokyo) Na Nuri, (Waseda U.) (Stu)Kobayashi Shunji, (Stu)Takabatake Mami, (Stu)Yoshihara Yu, (Ful)Hasegawa Kei, (Ful)Osawa Toshio	carbon nanotubes chemical vapor deposition self-organization	O
894	Fluidized-bed production of long carbon nanotubes and creation of three-dimensional electrodes for electric storage devices (Waseda U.) *(Ful)Noda Suguru, Chen Zhongming, (Stu)Kawabata Kosuke, (Stu)Hachiya Soichiro, Quintero Ricardo, (Stu)Xu Naiao, (Stu)Narubayashi Misato, (Stu)Hori Keisuke, (Stu)Kowase Takayuki, (Ful)Hasegawa Kei, (Ful)Osawa Toshio	carbon nanotubes fluidized bed electric storage devices	O
895	The deposition rate of the zinc oxide thin film growth by using a cold wall type CVD reactor. (Tokai U.) *(Stu)Kuroda Shingo, Yokoyama Yuki, Watanabe Masatoshi, Okubo Tatsuo, (Ful)Akiyama Yasunobu	CVD Zinc oxide transparent conductive film	P
905	Rapid vapor deposition of active materials and current collectors toward high-capacity, light-weight electric storage devices (Waseda U.) *(Ful)Noda Suguru, (U. Tokyo) Lee Jungho, (Waseda U.) (Stu)Aoi Shigeki, (Stu)Honda Yoichiro, (Ful)Hasegawa Kei, (Ful)Osawa Toshio	vacuum vapor deposition thin films lithium secondary batteries	O
906	Catalyst Nucleation and Carbon Nanotube Growth from Flame-Synthesized Co-Al-O Nanopowders at 10 Second Time Scale (Waseda U.) *(Stu)Shirae Hiroyuki, (Ful)Hasegawa Kei, (U. Michigan) Yi Eongyu, Laine Richard, (Waseda U.) (Ful)Noda Suguru	carbon nanotubes cobalt nanoparticles chemical vapor deposition	O
910	Construction of the overall reaction model for opitmizing SiC-CVD using Methyltrichlorosilane (U. Tokyo) *(Stu)Funato Y., (Stu)Sato N., (Stu)Shima K., (IHI) (Ful)Fukushima Y., (U. Tokyo) (Ful)Momose T., (Ful)Shimogaki Y.	SiC CVD Modelization	O
976	Fabrication and electrical properties of the PZT capacitors on Pt bottom electrodes with different orientation (Osaka Pref. U.) *(Stu)Amano T., (Stu)Takada Y., (Ful)Okamoto N., (Ful)Saito T., (Ful)Kondo K., Yoshimura T., Fujimura N., (Osaka.U.) Higuchi K., Kitajima A.	Ferroelectricity Orientation PZT capacitors	P

List of received applications (By topics code)

List of received applications
SCEJ 81st Annual Meeting (2016)

(C) 2016 The Society of Chemical Engineers, Japan. . All rights reserved.
Most recent update: 2016-05-19 11:21:01
For more information contact Organizing Committee, SCEJ 81st Annual Meeting (2016)
E-mail: inquiry-81a

www3.scej.org

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