Japanese page
SCEJ

SCEJ 82nd Annual Meeting (Tokyo, 2017)

K-2. [CR,SF,MI] Reaction Engineering of CVD: iCVD and Emerging Processes, Applications, and Fundamental Understanding <Closed session>

Organizer(s): Machida Hideaki (Gas-Phase Growth LTD.), Momose Takeshi (Univ. Tokyo), Noda Suguru (Waseda Univ.)

We invite Prof. Sung Gap Im at KAIST, Korea, the winner of the SCEJ Award for Outstanding Asian Researcher and Engineer 2016. He will deliver a lecture on his iCVD (initiated chemical vapor deposition) method for low temperature deposition of uniform, ultrathin polymer films, and their electronics and biomedical applications. We will also discuss the analysis of CVD processes based on reaction engineering, rational design and development of new processes based on understanding of CVD mechanisms, and applications to advanced materials and devices.


Topics code list
SCEJ 82nd Annual Meeting (Tokyo, 2017)

© 2016 The Society of Chemical Engineers, Japan. All rights reserved.
Most recent update: 2016-12-15 11:25:36
For more information contact Organizing Committee, SCEJ 82nd Annual Meeting (Tokyo, 2017)
E-mail:
This page was generated by easp 2.39; mknote 2.40 (C)1999-2016 kawase