Most recent update: 2023-05-11 20:44:01
![]() in this topics code. | Keywords | Number | |
---|---|---|---|
CVD | 3 | ![]() | |
Chemical vapor deposition | 2 | ![]() | |
reflectance | 1 | ![]() |
ACKN No. | Title/Author(s) | Keywords | Style |
---|---|---|---|
7 | CVD process from dichlorosilane, boron trichloride and monomethylsilane gases | dihlorosilane boron trichloride monomethylsilane | O |
79 | Synthesis of boron nitride nanotubes using boric acid as a boron source | Boron nitride nanotube Chemical vapor deposition Template coating | P |
157 | Fabrication of mono-crystalline Si film on porous Si by rapid vapor deposition method | Mono-crystalline Si film Rapid vapor deposition Porous Si | P |
217 | Density Function Theory Study of Copper bis(2,2,6,6-tetramethyl-3,5-heptanedionate) Adsorption on Cu (111) surface | Atomic Layer Depositon Density Function Theory Surface Adsorption | O |
245 | Refinement of surface reaction mechanism of SiC-CVI based on theoretical study | SiC CVI surface reaction model | O |
312 | Formation of texture on silicon substrates by alkaline etching, and evaluation of the texture | alkaline etching silicon substrates texture | P |
516 | Study of Co deposition with Atomic Layer Deposition on an ultra light-weight X-ray telescope | Atomic Layer Deposition micropore optics x-ray | P |
528 | The coke deposition rate from paraffins and olefins | fouling coking CVD | O |
540 | Aluminum nitride film production by chemical vapor deposition from triethylaluminum | CVD triethylaluminum AlN | O |
547 | Molecular Simulation Study on Effect of Group-III Precursors on III-V Compound Crystal Growth | MOCVD molecular simulations III-V compound | O |
554 | Chemical Vapor Deposition Rate Control of Bismuth-based Perovskite Thin Film for Photovoltaic Performances Improvement | Chemical vapor deposition Methylammonium bismuth iodide Molten bismuth | O |
597 | In-situ visible light reflectance observation method for designing Co-ALD process with high substrate selectivity. | ALD in-situ observation reflectance | O |
676 | CFD simulation of CVD reactors in the CH3SiCl3(MTS)/H2 system using a simple SiC growth model | CVD MTS CFD | P |
705 | Investigation on pretreatment conditions for low-resistivity copper film formation on dielectrics using supercritical fluid deposition | SCFD Polymer resistivity | O |