Time | Paper ID | Title / Authors | Keywords | Topic code | Ack. number |
---|---|---|---|---|---|
Symposium <Materials and Process in Electronics> | |||||
(9:00–10:40) (Chair: Okamoto N., Kondo K.) | |||||
M101 | Analysis of Cu(I) Complexes in Copper Sulfate Electroplating Solution by Using Reaction Kinetics with a Chelate Reagent | Cu(I)-PEG complex Chelate reagent Bathocuproinedisulfonic acid disodium salt | S-13 | 959 | |
M102 | Kinetic Monte Carlo simulation of TSV filling | through silicon via kinetic Monte Carlo additives | S-13 | 146 | |
M103 | Copper(I) ion concentration's distributions of the inside of through holes while electrodepositing | through hole via copper electrodepositing | S-13 | 325 | |
M104 | Via filling electrodeposition- reaction and additives | Copper Electrodeposition Additive Reaction | S-13 | 90 | |
(10:40–12:00) (Chair: Ohtsuka K., Yokoi M.) | |||||
M106 | Diallylamine additive's effect on copper via filling | electrodeposition additive copper | S-13 | 40 | |
M107 | High Speed TSV Filiing by Using Cornic Via | TSV electro deposition Copper | S-13 | 173 | |
M108 | Effect of via bottom cuprous ion concentration on via filling electrodeposition current | Copper electrodeposition cuprous ion concentration current density | S-13 | 153 | |
M109 | Influence on the deposit reaction by monovalent copper and the additive in copper plating | RRDE copper deposition | S-13 | 175 | |
(12:40–14:20) (Chair: Kimizuka R., Ohnuki J.) | |||||
M112 | Resistivity Reduction in Nano-Scale Cu Wires Using High-Purity Electrolyte (Graduate School, Sci. and Tech., Ibaraki U.) Onuki Jin, | Cu Interconnects Electroplating Resistivity | S-13 | 565 | |
M114 | Acceleration of the copper electrodeposition reaction by small amount of Cl- Ions | electrodeposition additives copper | S-13 | 174 | |
M115 | Reduction of thermal expansion coefficient of electrodeposited copper for TSV | TSV Copper thermal expansion coefficient | S-13 | 111 | |
M116 | Copper Wire Transparent Conductive Film | Copper Electrodeposition Transparent | S-13 | 169 | |
(14:20–16:00) (Chair: Saito T., Sudo M.) | |||||
M117 | Polyimide film for electroless plating corresponding to desmear processing | polyimide desmear electroless plating | S-13 | 216 | |
M118 | Energy analysis and efficiency of the fuel cell | fuel cell energy analysis cell efficiency | S-13 | 115 | |
M119 | Sn film prepared by electrodeposition as negative electrode for Na-ion secondary batteries | Na-ion battery Sn electrodeposition | S-13 | 177 | |
M120 | Mechanism of hydrogen peroxide formation in PEMFC under operating condition | PEMFC hydrogen peroxide degradation | S-13 | 223 | |
M121 | Unsaturated and non-uniformly distributed water transport in the membrane for polymer electrolyte fuel cell. | PEFC water transport NWTC | S-13 | 275 | |
(16:00–17:20) (Chair: Takeuchi M., Marunaka M.) | |||||
M122 | Solubility behavior and crystal growth of GaN in super critical ammonia with doping metal | GaN ammonothermal solubility | S-13 | 612 | |
M123 | Optimal design of FPC made of porous PI | porous dielectric film | S-13 | 95 | |
M124 | Discussion about the improvement plan for discharge characteristics of electric double layer capacitor | Electric double layer capacitor porous electrode theory activated carbon electrode | S-13 | 251 | |
M125 | Effective factors on discharge capacity of rechargeable alkaline zinc-air battery | alkaline solution electrodeposition electrolyte flow | S-13 | 293 |