SCEJ

SCEJ 47th Autumn Meeting (Sapporo, 2015)

Hall and day program

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Hall N

Most recent update: 2015-08-26 10:00:42

Day 1
TimePaper
ID		Title / AuthorsKeywordsTopic codeAck.
number
SCEJ Division session SE-10. <Materials and Process in Electronics>
(10:00–12:00) (Chair: Tokoro K., Kaneko Y.)
10:00– 10:20N104Low TEC Copper Electrodeposition
(Osaka Pref. U.) *Kondo Kazuo, Mukahara Shingo, Yokoi Masayuki
Copper
Electrodeposition
Thermal Expansion Coefficient
SE-1017
10:20– 10:40N105printed pattern of nucleating agent ink for electroless plating with micro-contact printing method
(AIST) *Tokoro K., Onoue M., Shirakawa N., Ushijima H., (Nissan Chemical) Kojima K., Chikama K.
printed electronics
Electrodeposition
micro-contact printing
SE-10217
10:40– 11:00N106Electrodeposition simulation in the manufacturing process of electrolytic copper foil
(FITEC) *Ishimaru Y., Miyazaki S., (FURUKAWA ELECTRIC) Orita N.
electrodeposition
simulation
electrolytic copper foil
SE-10736
11:00– 11:20N107High-Speed Through Silicon Via (TSV) Filling
(Osaka Pref. U.) *Hoang Van Ha, Kondo Kazuo
high speed TSV filling
3D packaging
electrolyte optimization
SE-10402
11:20– 11:40N108The modeling of TSV filling by using Monte Carlo Simulation
(Kyoto U.) *Tsugo Takahiro, Kaneko Yutaka
Monte Carlo Simulation
Through-silicon via
Additives
SE-10340
11:40– 12:00N109Kinetic on Copper Damascene (Electroplating )and Cuprous Concentration Computation in the presence of Cl- and SPS
(Osaka Pref. U.) *Hoang Van Ha, Kondo Kazuo, Yokoi Masayuki
TSV filling
Cuprous
Copper plating kinetic
SE-10419
(13:00–14:20) (Chair: Kondo K.)
13:00– 13:40N113[Invited lecture] Microvia and Through-Hole Filling by Electroplating for Electronic Circuit Fabrication
(Nat. Chung Hsing U.) Dow W.-P.
Copper
Via
additive
SE-1031
13:40– 14:20N115[Invited lecture] Device technology in Cognitive Computer System
(GNC) Takeno Yasuhiko
デバイス
CCS
半導体
SE-10107
(14:40–16:00) (Chair: Takeno Y., Orita N.)
14:40– 15:20N118[Invited lecture] TSV solution in ULVAC
(ULVAC) Morikawa Yasuhiro
TSV
Etcher
Plasma
SE-1023
15:20– 16:00N120[Invited lecture] Monte Calro computation of via filling and additive by Copper electrodeposition
(Kyoto U.) Kaneko Yutaka
Monte Calro
Copper electrodeposition
Additive
SE-1025

Day 2
TimePaper
ID		Title / AuthorsKeywordsTopic codeAck.
number
SCEJ Division Symposium SY-4. <Recent Research and Development of Process Systems Engineering>
(9:00–10:20) (Chair: Hamaguchi T., Baba K.)
9:00– 9:20N201Adaptive soft sensor method based on just-in-time model and ensemble learning
(U. Tokyo) *Kaneko Hiromasa, Funatsu Kimito
soft sensor
just-in-time
ensemble learning
SY-412
9:20– 9:40N202Development of Process Models for Enhancing Yield in Sterile Drug Product Manufacturing
(U. Tokyo) Yabuta Keisho, Hirao Masahiko, *Sugiyama Hirokazu
Pharmaceutical manufacturing
Processing matrix
Fault Tree Analysis
SY-4807
9:40– 10:00N203A role of PSE in design of sustainable system
(U. Tokyo) Kikuchi Y.
sustainability
system design
scenario analysis
SY-4812
10:00– 10:20N204Systematic Approach for design and evaluation of cyber-security measures for ICS
(NITech) *Hashimoto Yoshihiro, (Shinsei Bank) Takagi Hitomi, (NITech) Koshijima Ichiro
Cyber-Security
Safety
Process Control
SY-421
(10:40–11:40) (Chair: Hirao M., Mizuta M.)
10:40– 11:00N206Detection and avoidance of abnormal behaviors of chemical processes with uncontrollable events/unobservable statuses
(Nagoya U.) *Imaizumi Y., Hashizume S., Hashizume S., Yajima T., Onogi K.
abnormal behavior
fault avoidance control
controllability and observability
SY-4889
11:00– 11:20N207Improvement of process completion time in manufacturing systems with stochastic processing time
(Nagoya U.) *Imaoka Y., Hashizume S., Yajima T., Onogi K.
improvement of process completion time
critical path
stochastic processing time
SY-4890
11:20– 11:40N208Entropy based matching between processes in low volume production of a wide variety of products
(Nagoya U.) *Morizuki T., Hashizume S., Yajima T., Onogi K.
matching between processes
entropy
scheduling
SY-4891
(13:20–14:40) (Chair: Hashimoto Y., Uodome Y.)
13:20– 13:40N214[Outstanding Paper Award] Prediction of Molten Steel Temperature in Steel Making Process with Uncertainty by Integrating Gray-Box Model and Bootstrap Filter
(NUST) *Ahmad Iftikhar, (Kyoto U.) Kano Manabu, Hasebe Shinji, (NSSMC) Kitada Hiroshi, (Waseda U.) Murata Noboru
Gray-box model
Bootstrap filter
Steel making process
SY-46
13:40– 14:00N215Development and verification of a first principle model of the Czochralski process with industrial data
(Kyoto U.) Zheng Zhongchao, *Seto Tatsuru, Kim Sanghong, Kano Manabu, (SUMCO) Fujiwara Toshiyuki, Mizuta Masahiko, (Kyoto U.) Hasebe Shinji
Czochralski process
First principle model
Industrial application
SY-489
14:00– 14:20N216Investigation of degradation of polylactic acid using near-infrared spectrum and statistical data analysis
(Kyoto U.) *Yoshida Akihisa, Muroga Shun, Kim Sanghong, Hikima Yuta, Ohshima Masahiro, Hasebe Shinji
Polylactic acid (PLA)
Statistical data analysis
Near-infrared spectrum (NIR)
SY-4502
14:20– 14:40N217A Structure Synthesis Procedure of Distillation Processes for Efficient Use of Various Heat Resources
(Kyoto U.) *Takase Hiroshi, Hasebe Shinji
Process Synthesis
Energy Saving
Linear Formulation
SY-4232
(15:00–16:20) (Chair: Funatsu K., Naitou K.)
15:00– 15:20N219Process Simulation of Extractive Distillation for Ethanol + Water Azeotrope with Ethylene glycol or Tetraehtylene Glycol
(AT-PP) *Oba Shigeo, (CIT, Nihon U.) Tsuji Tomoya, (CST, Nihon U.) Tochigi Katsumi
azeotrope
process simulator
extractive distillation
SY-4292
15:20– 15:40N220Operational optimization of distillation systems using online simulator
(Yokogawa Electric) *Takenaka Azusa, Kashiwa Ryosuke, Omata Toshiaki
online simulator
operational optimization
distillation
SY-461
15:40– 16:00N221Fundamental Study on Evaluation Method of Organization Resilience
(NITech) *Davaadorj Nyambayar, Koshijima Ichiro, Hashimoto Yoshihiro, Aoyama Tomomi
Resilience matrix
Organization Resilience
SY-4525
16:00– 16:20N222Development of CAD for Plant-Wide Control Loop Configuration
(NITech) *Takahashi Yuya, Hashimoto Yoshihiro
Plant-Wide Control
control loop configuration
CAD
SY-4676
Technical program
SCEJ 47th Autumn Meeting (Sapporo, 2015)
© 2015 The Society of Chemical Engineers, Japan. All rights reserved.
Most recent update: 2015-08-26 10:00:42
For more information contact Organizing Committee, SCEJ 47th Autumn Meeting (Sapporo, 2015)
E-mail: inquiry-47fwww3.scej.org
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