List of Received Applications (5-h) [Japanese]

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5) Chemical reaction engineering

5-h. CVD & dry processes

Most recent update: 2020-09-26 15:59:01

The keywords that frequently used in this topics code.	Keywords	Number
	CVD	4
	carbon nanotube	3
	chemical vapor deposition	2
	fluidized bed	1

ACKN No.	Title/Author(s)	Keywords	Style
103	Kinetic analysis of TiAlN-CVD process for construction of reaction model (2) (U. Tokyo) *(Stu)Yamaguchi Jun, Hirabaru Tomoko, (Kyocera) (Cor)Kubo Hayato, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Kyocera) (Cor)Tanibuchi Takahito, (U. Tokyo) (Reg)Shimogaki Yukihiro	CVD TiAlN cutting tool	P
222	Theoretical study for modeling surface reactions on SiC-CVI process (U. Tokyo) *(Stu)Sato Noboru, (Stu)Otaka Yuhei, (Stu)Aji Ryosuke, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro	CH3SiCl3 SiC CVI surface reaction	O
396	Feeding metalorganic vapors, supporting catalysts and synthesizing long carbon nanotubes by fluidized bed (Waseda U.) *(Stu)Tatsukawa Arin, Li Mochen, (Reg)Sugime Hisashi, (Reg)Osawa Toshio, (Reg)Noda Suguru	carbon nanotube fluidized bed chemical vapor deposition	P
450	Effect of SiCl4 addition for SiC-CVD from MTS/H2 (U. Tokyo) *(Stu)Otaka Yuhei, (Stu)Aji Ryosuke, (Stu)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro	CVD SiC Recycle	P
462	Time-evolution of film thickness profiles by level set method during CVD multiscale simulation (U. Tokyo) *(Stu)Zhang Jin, (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro	multiscale simulation chemical vapor deposition level set method	O
515	Fabrication and hierarchical structure control of carbon nanotube electron field emitter for X-ray tube (Waseda U.) *(Stu)Yasui Kotaro, Kitagawa Sae, (Reg)Sugime Hisashi, Ochi Hayato, Takahashi Daizo, (Waseda U.) (Reg)Noda Suguru	carbon nanotube electron field emitter hierarchical structure control	P
572	Effects of dispersant for PECVD process with concurrent use of solid raw material upon synthesized composite thin films (Hiroshima U.) *(Reg)Shimada Manabu, (PCEF)Takahashi Kazuma, (Reg)Kubo Masaru	titanium dioxide carbon nanotube photocatalyst	O
608	Residual stress in gas barrier silica film prepared by plasma chemical vapor deposition (Kyoto U.) *(Reg)Kawase M., (Stu)Hirata S., (Stu·PCEF)Wakisaka T.	CVD residual stress silica gas barrier film	O
614	Development of methylammonium lead iodide perovskite film CVD process (Kyoto U.) *(Reg)Kawase M., (Stu)Murakami T., (Stu)Matsuda M.	CVD methylammonium lead iodide lead melt	O

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List of received applications (By topics code)

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List of received applications
SCEJ 85th Annual Meeting (2020)
IChES 2020

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Most recent update: 2020-09-26 15:59:01
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