Shimizu Hideharu - Program search result - SCEJ 89th Annual Meeting (Sakai, 2024)

`SCEJ 89th Annual Meeting (Sakai, 2024)`

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Program search result : Shimizu Hideharu : 3 programs

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Authors field exact matches “Shimizu Hideharu”; 3 programs are found.
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Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
Organized Session (CVD Reactions Section, Division of Chemical Reaction Engineering)
Day 2 9:00– 10:00	Chair: Shimogaki Yukihiro, Shimizu Hideharu
	F201	Reaction Rate Equation Determination of Chemical Vapor Deposited Bismuth-based Perovskite Thin Film (Kyoto U.) *(Int)Yang Ziguang, (Stu)Togami Keito, (Stu)Tanabe Maika, (Reg)Kawase Motoaki	Chemical vapor deposition Methylammonium bismuth iodide Perovskite solar cell	5-h	686
	F202	Evaluation of Reactive sputtered MAX alloy thin films with reducing gas (Osaka Metro. U.) *(Reg)Saito Takeyasu, (Stu·PCEF)Ueda Kazuki, (Reg)Okamoto Naoki	sputtering MAX-phase	5-h	787
	F203	Rate analysis of carbon CVD from hydrocarbons with different degrees of unsaturation (Kyoto U.) (Stu)Nakano Shinji, (Reg)Fujitsuka Hiroyasu, *(Reg)Kawase Motoaki	CVD carbon coking	5-h	785
Day 3 10:00– 10:20	G304	Silicon Nitride ALD Process Using High Purity Hydrazine (Taiyo Nippon Sanso) *(Cor)Wada Yoshifumi, (Cor)Murata Hayato, (Cor)Shimizu Hideharu	Siicon Nitride Atomic Layer Deposition Incubation Cycle	5-h	109
Day 3 10:40– 12:00	Chair: Sugime Hisashi, Shimizu Hideharu
	G306	Investigation of Area Selective Co-ALD process utilizing in-situ observation of reflectance intensity. (U. Tokyo) *(Stu)Kimura Shunsuke, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Momose Takeshi, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	ALD in-situ observation reflectance	5-h	232
	G307	Investigation of Continuous Cu Film Formation Process on Polymer (U.Tokyo) *(Stu)Nakajima Yusuke, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	Atomic Layer Depoition Copper on Polymer	5-h	531
	G308	Surface activation of the copper surface by VUV-Redox method using xenon excimer lamp (Osaka Metro. U.) *(Reg)Endo Shinichi, (Reg)Saito Takeyasu	VUV-Redo Surface activation	5-h	786
	G309	CFD Simulation Study on factors influencing AlN compound single crystal growth (Kyoto U.) *(Stu)Li Yafei, Murahashi Kousuke, (Reg)Kawase Motoaki	MOCVD CFD III-V compound	5-h	683

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SCEJ 89th Annual Meeting (Sakai, 2024)

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