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SCEJ 54th Autumn Meeting (Fukuoka, 2023)

Program search result : 羽深 等 : 4 programs

The preprints(abstracts) are now open (Aug. 28). These can be viewed by clicking the Paper IDs. The ID/PW sent to the Registered participants and invited persons are required.

Authors and Chairs (J) field exact matches “羽深 等”; 4 programs are found. (“Poster with Flash” presentations are double-counted.)
The search results are sorted by the start time.

TimePaper
ID
Title / AuthorsKeywordsTopic codeAck.
number
Day 1
15:0015:20
S119Precursor interactions for SiCxNyOz plasma-enhanced chemical vapor deposition at room temperature
(Yokohama Nat. U.) Kawakami Hiroki, Hori Kenta, Watanabe Toru, *(Reg)Habuka Hitoshi
SiCNO
PECVD
Interaction
ST-2494
Day 1
15:0017:00
   Chair: Shimada Manabu, Habuka Hitoshi
S119Precursor interactions for SiCxNyOz plasma-enhanced chemical vapor deposition at room temperature
(Yokohama Nat. U.) Kawakami Hiroki, Hori Kenta, Watanabe Toru, *(Reg)Habuka Hitoshi
SiCNO
PECVD
Interaction
ST-2494
S120Low temperature CVD process development for AlN thin films for 3DICs.
(U. Tokyo) *(Stu)Obara S., Ninomiya T., Takagi T., (Reg)Momose T., (Reg)Shimogaki Y.
AlN film
chemical vapor deposition
low temperature
ST-24229
S121Feed of Gaseous Boron Source Using Solid Boron and Water Vapor and Synthesis of Boron Nitride Nanotubes via Template Coating Method
(Waseda U.) *(Stu·PCEF)Kaida Takazumi, Takahashi Hiromu, (Reg)Li Mochen, (Reg)Osawa Toshio, (Reg)Noda Suguru
Boron Nitride Nanotube (BNNT)
Template coating method
Boron oxide
ST-24168
S122Development of low-resistivity copper thin film formation process on polymer by supercritical fluid thin film deposition method
(U. Tokyo) *(Stu)Nakajima Yusuke, (Reg)Shimogaki Yukihiro, (U. Tokyo/Kumamoto U) (Reg)Momose Takeshi
SCFD
Polymer
resistivity
ST-24304
S123Development of damage-less dry-purification of carbon nanotubes using Br2 vapor
(Waseda U.) *(Stu·PCEF)Goto Takuma, (Reg)Osawa Toshio, (Reg)Noda Suguru
Carbon nanotube
Purification
Bromine vapor
ST-24344
S124In-situ Quartz Crystal Microbalance Measurement of Adsorption for Trimethylaluminum
(U. Tokyo) *(Stu)Wu Yuxuan, (Stu)Liu Haonan, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Tsukune Atsuhiro, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
ALD
QCM
Adsorption
ST-24705
Day 2
9:4010:00
C203Influence of wafer load/unload operation in batch-type wafer cleaning
(Yokohama Nat. U.) Tsuchida Toko, *(Reg)Habuka Hitoshi, (PreTech) Goto Akihiro
Wafer cleaning
Wafer operation
Betch-type cleaner
SY-7795
Day 2
13:4015:40
   Chair: Habuka Hitoshi
C215[Review lecture] Haptics technology Development to create excitement
(Sony) Nakagawa Yusuke
Haptics technology
SY-77224
C217[Invited lecture] Current Status and Potential of Perovskite Solar Cells
(AIST) Kogo Atsushi
Perovskite Solar Cells
SY-77113
C218Consideration of Electrochemical Reaction for Graphene Dispersed in Alkaline Aqueous Solution
(Osaka Metro. U.) *(Reg)Okamoto Naoki, Miyake Rei, (Reg)Saito Takeyasu
Graphene
Electrochemical Reaction
SY-77835
C219Investigation of electrochemical Cu doping to ZnS prepared by electrodeposition method
(Osaka Metro. U.) *(Reg)Okamoto Naoki, Matsuda Naohiro, (Reg)Saito Takeyasu
electrodeposition
ZnS
Cu
SY-77848
C220Investigation of defect reduction of Ni electroforming in the mold manufacturing process
(Osaka Metro. U.) *(Stu)Mizobata Ryo, (Reg)Okamoto Naoki, (Reg)Saito Takeyasu, (Parity Innovations) Maeda Yuki, Maekawa Satoshi
electroforming
Ni
mold manufacturing process
SY-77867

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SCEJ 54th Autumn Meeting (Fukuoka, 2023)


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