Hall S, Day 2 - Hall and day program - SCEJ 54th Autumn Meeting (Fukuoka, 2023)

`SCEJ 54th Autumn Meeting (Fukuoka, 2023)`

Last modified: 2023-12-10 19:09:26

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Hall and day program : Hall S, Day 2

The preprints(abstracts) are now open (Aug. 28). These can be viewed by clicking the Paper IDs. The ID/PW sent to the Registered participants and invited persons are required.

Hall S(815), Day 2(Sep. 12)

ST-24

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
ST-24 [Trans-Division Symposium] CVD, ALD and Dry Processes
(9:00–10:20) (Chair: Sugime Hisashi, Shimizu Hideharu)
9:00– 9:20	S201	Observation of the initial process of Cobalt film growth using variations in reflected light intensity. (U. Tokyo) *(Stu)Kimura Shunsuke, (Reg)Yamaguchi Jun, (Reg)Sato Noboru, (Reg)Momose Takeshi, (Reg)Tsukune Atsuhiro, (Reg)Shimogaki Yukihiro	cobalt ALD reflectance	ST-24	895
9:20– 9:40	S202	Morphology Improvement of Chemical Vapor Deposited Bismuth-based Perovskite Thin Film for Photovoltaic Use (Kyoto U.) *(Int)Yang Ziguang, (Stu)Togami Keito, (Stu)Tanabe Maika, (Reg)Kawase Motoaki	Chemical vapor deposition Methylammonium bismuth iodide Molten bismuth	ST-24	425
9:40– 10:00	S203	Rate analysis of coke deposition from hydrocarbons with different degrees of unsaturation (Kyoto U.) *(Stu)Nakano Shinji, (Reg)Fujitsuka Hiroyasu, (Reg)Kawase Motoaki	coking CVD Carbon	ST-24	255
10:00– 10:20	S204	Production of silicon-carbon composite materials by chemical vapor deposition for negative electrode of lithium-ion battery (Waseda U.) *(Stu·PCEF)Oka Junya, (Reg)Osawa Toshio, (Reg)Noda Suguru	Chemical Vapor Deposition (CVD) Silicon Lithium-ion battery	ST-24	76
10:20– 10:40		Break
(10:40–11:50) (Chair: Sugime Hisashi, Shimizu Hideharu)
10:40– 11:00	S206	Detailed study of the effect of SiCl₄ addition to SiC-CVI by MTS/H₂ (U. Tokyo) *(Stu)Otaka Yuhei, (Reg)Sato Noboru, (Stu)Kimura Shunsuke, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro	SiC CVI MTS	ST-24	862
11:00– 11:20	S207	Investigation of high-speed impregnation conditions using high-concentration hydrogen supply in SiC-CVI process (U. Tokyo) *(Stu)Kimura Shunsuke, (Stu)Otaka Yuhei, (Reg)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro	SiC CVI CVD	ST-24	843
11:20– 11:50	S208	[Invited lecture] Development of Epitaxial Growth for High Performance SiC Power Devices (Mitsubishi Electric) Tanaka Takanori	Silicon carbide Power device Epitaxial growth	ST-24	518
(13:00–14:20) (Chair: Momose Takeshi, Noda Suguru)
13:00– 13:40	S213	[Review lecture] Current Status and Future Prospects of Hard Coatings for Cutting Tools by Chemical Vapor Deposition (Kyocera) (Cor)Tanibuchi Takahito	CVD Cutting tool Hard coating	ST-24	150
13:40– 14:00	S215	DFT study on reaction paths of AlN growth by MOCVD (Kyoto U.) *(Stu)Li Yafei, (Reg)Kawase Motoaki	DFT AlN MOCVD	ST-24	423
14:00– 14:20	S216	Improvement of COSMO-SAC method for estimating vapor pressure of metal complex (U. Tokyo) *(Reg)Sato Noboru, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro	COSMO-SAC metal complex vapor pressure	ST-24	824
(14:20–15:50) (Chair: Nishida Satoshi, Funato Yuuichi)
14:20– 14:40	S217	Photocatalytic Performance Evaluation of TiO₂ and TiO₂-CuO Nanoparticulate Thin Films Prepared by a Gas Phase System (Hiroshima U.) *(Stu)Hudandini Meditha, (ITS, Indonesia) Kusdianto K., (Hiroshima U.) (Reg)Kubo Masaru, (Reg)Shimada Manabu	PECVD PVD TiO2-CuO heterojunction	ST-24	778
14:40– 15:00	S218	Investigation of visible light responsive CuO_x/TiO₂ photocatalytic reaction mechanism using model catalyst structure (U. Tokyo) *(Stu)Tanaka Jun, (Stu)Nakajima Yusuke, (Reg)Shimogaki Yukihiro, (Reg)Momose Takeshi	photocatalyst visible light reaction mechanism	ST-24	926
15:00– 15:20	S219	Evaluation of the Physical Properties of Reactive sputtered MAX alloy thin films (Osaka Metro. U.) *(Stu·PCEF)Ueda Kazuki, Wakamatsu Kazunobu, (Reg)Saito Takeyasu, (Reg)Okamoto Naoki	sputtering MAX-phase	ST-24	876
15:20– 15:50	S220	[Invited lecture] Structure and morphology control in thin films by using sputtering (Kyushu U.) Itagaki Naho	sputtering thin film morphology control	ST-24	783
(15:50–16:20)
15:50– 16:20		Closing remark and Subdivision Meeting

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SCEJ 54th Autumn Meeting (Fukuoka, 2023)

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