SCEJ 84th Annual Meeting (Tokyo, 2019)
Last modified: 2019-03-12 11:30:00
Program search result : CVD : 6 programs
The preprints(abstracts) can be viewed by clicking the Paper IDs.
The ID/PW printed on the PROGRAM book are required.
(The ID/PW have also been sent to the Earlybird registers and invited persons by e-mail.)
The programs of
HC-13,
HC-17,
K-1 were updated.
Keywords field exact matches “CVD”; 6 programs are found.
The search results are sorted by the start time.
Time | Paper ID | Title / Authors | Keywords | Topic code | Ack. number |
Day 2 9:40– 10:00 | F203 | Preparation of CVD silica membrane formed on the one-end sealed support
(RITE) *(Reg)Urai Hiromi, (Reg)Nishino Hitoshi, (Reg)Seshimo Masahiro, Yamaguchi Yuichiro, (Reg)Nakao Shin-ichi | siloca membrane CVD hydrogen
| 4-a | 1038 |
Day 3 9:20– 11:20 | PD310 | Ion separation through novel silica hybrid membranes
(Shibaura Inst. Tech.) *(Stu)Yoshiura J., (Stu)Ishii K., (Stu)Shibata A., (Stu)Takeuchi T., Urabe T., Kameda Y., (Reg)Nomura M. | Silica membrane CVD ion separation
| 4-a | 1208 |
Day 3 9:20– 11:20 | PD314 | Investigation of deposition mechanism for the CVD derived silica membranes
(Shibaura Inst. Tech.) *(Stu)Ishii K., (Stu)Shibata A., (Stu)Takeuchi T., Urabe T., Kameda Y., (Stu)Yoshiura J., (Reg)Nomura M. | silica membrane CVD inorganic membrane
| 4-a | 185 |
Day 3 9:20– 11:20 | PD315 | Preparation of Silicon Carbide Membrane by Counter Diffusion Chemical Vapor Deposition
(JFCC) *(Reg)Nagano Takayuki, Sato Koji | Silicon Carbide CVD Gas Seapration
| 4-a | 18 |
Day 3 13:20– 15:20 | PE358 | Study for reducing by-product and precursor recycle in SiC-CVD
(U. Tokyo) *(Stu)Otaka Yuhei, (Stu)Oda Takumi, (Stu)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro | CVD CVI SiC
| 5-h | 970 |
Day 3 13:20– 15:20 | PE371 | Kinetic analysis on TiAlN-CVD process to construct reaction model
(U. Tokyo) *(Stu)Yamaguchi Jun, Hirabaru Tomoko, (Kyocera) (Cor)Kubo Hayato, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Kyocera) (Reg)Tanibuchi Takahito, (U. Tokyo) (Reg)Shimogaki Yukihiro | CVD TiAlN cutting tool
| 5-h | 982 |
Technical program
Technical sessions (Wide)
(For narrow screen)
Session programs
Search in technical program
SCEJ 84th Annual Meeting (Tokyo, 2019)
© 2023 The Society of Chemical Engineers, Japan. All rights reserved.
For more information contact SCEJ 84th Annual Meeting Organizing Committee
E-mail: inquiry-84awww3.scej.org