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SCEJ 82nd Annual Meeting (Tokyo, 2017)

Session programs : K-2

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K-2 [International Symposium]
 Reaction Engineering of CVD: iCVD and Emerging Processes, Applications, and Fundamental Understanding

Organizer: Machida Hideaki (Gas-Phase Growth LTD.), Momose Takeshi (Univ. Tokyo), Noda Suguru (Waseda Univ.)

We invite Prof. Sung Gap Im at KAIST, Korea, the winner of the SCEJ Award for Outstanding Asian Researcher and Engineer 2016.
He will deliver a lecture on his iCVD (initiated chemical vapor deposition) method for low temperature deposition of uniform, ultrathin polymer films, and their electronics and biomedical applications. We will also discuss the analysis of CVD processes based on reaction engineering, rational design and development of new processes based on understanding of CVD mechanisms, and applications to advanced materials and devices.

Hall E, Day 2

TimePaper
ID
Title / AuthorsKeywordsTopic codeAck.
number
Hall E(Kyoshitsu-to 4F 404), Day 2(Mar. 7)
(9:00–12:00) (Chair: Noda Suguru)
9:009:40E201[Invited lecture] Analysis and Design of CVD/ALD processes Based on Chemical Reaction Engineering
(U. Tokyo) (Ful)Shimogaki Yukihiro
Chemical Reaction Engineering
CVD
Process Design
K-2838
9:4010:20E203[Invited lecture] Cat-CVD and Its Development to Various Fields
(JAIST) Matsumura Hideki
Thin Film Technology
Cat-CVD
Cat-doping
K-282
10:2010:40E205[Requested talk] Reaction Mechanism and Growth-rate Distribution in Metal-Organic Vapor-Phase Epitaxy of GaN
(U. Tokyo) *(Ful)Sugiyama Masakazu, (Ful)Momose Takeshi, (Politecnico Di Milano) Ravasio Stefano, Cavallotti Carlo, (U. Tokyo) (Ful)Shimogaki Yukihiro
GaN
MOVPE
reaction mechanism
K-2324
10:4011:00E206[Requested talk] Plasma decomposition of hexamethyldisiloxane, oxygen, and ammonia for coating a polymer substrate with silica-based film
(Kyoto U.) (Ful)Kawase M.
Plasma CVD
silica-based gas-barrier film
HMDSO
K-2740
11:0011:20E207[Requested talk] B-atom release from metal wires boronized by non-explosive boron compounds
(Shizuoka U.) Umemoto Hironobu
chemical vapor deposition
hot wire
boron atoms
K-217
11:2011:40E208[Requested talk] Surface reaction design for silicon epitaxial growth based on the reactor simulation
(Yokohama Nat. U.) *(Ful)Habuka Hitoshi, Watanabe Toru, Yamada Ayami, Saito Ayumi, Sakurai Ayumi
silicon epitaxial growth rate
trichlorosilane
silicon hydride
K-214
11:4012:00E209[Requested talk] CVD and ALD precursor candidates for transition metal film deposition
(Gas-Phase Growth) Machida Hideaki
Transition metal film
Amidinate precursor
Ethyl derivatives
K-2157
(13:00–15:20) (Chair: Momose Takeshi)
13:0013:40E213[The SCEJ Award for Outstanding Asian Researcher and Engineer] Vapor-phase deposition of functional polymer films and their applications
(KAIST) Im Sung Gap
initiated chemical vapor deposition
functional polymer films
electronic, separation, and biomedical applications
K-226
13:4014:20E215[Invited lecture] Application of Cat-CVD technology to crystalline silicon solar cells
(JAIST) *Ohdaira Keisuke, Trinh Cham Thi, Oikawa Takafumi, Seto Junichi, Koyama Koichi, Matsumura Hideki
catalytic chemical vapor deposition
crystalline Si solar cell
passivation
K-285
14:2014:40E217[Requested talk] Synthesis of carbon nitride using microwave plasma CVD
(Gifu U.) *Tanaka Ippei, (Chiba Inst. Tech.) Sakamoto Yukihiro
plasma
CVD
carbon nitride
K-2477
14:4015:00E218[Requested talk] PEALD-TiO2 films synthesized via CCRF discharges
(Tokyo Electron Yamanashi) Iwashita Shinya
TiO2
PEALD
deposition
K-2217
15:0015:20E219[Requested talk] Surface coating of carbon nanotubes by aerosol process with plasma enhanced chemical vapor deposition
(Hiroshima U.) *(Ful)Shimada Manabu, (Ful)Kubo Masaru, (Hiroshima U./ITS Surabaya) (Ful)Kusdianto K.
PECVD
carbon nanotube
dry coating process
K-2396
(15:40–17:20) (Chair: Machida Hideaki)
15:4016:00E221[Requested talk] Novel catalytic property of structured catalyst prepared by wet-type chemical deposition
(Shizuoka U.) (Ful)Fukuhara Choji
Electroless plating
Structured catalyst
Hydrogen production
K-2198
16:0016:20E222[Requested talk] Thin film deposition in supercritical fluids - impact of solvent capability on deposition characteristics
(U. Yamanashi) (Ful)Kondoh Eiichi
supercritical fluids
solvent capability
thin film deposition
K-2184
16:2016:40E223[Requested talk] Hot-filament CVD growth of low-resistivity diamond for power device applications
(AIST) Ohmagari Shinya
hot-filament CVD
diamond
low-resistivity
K-2219
16:4017:00E224[Requested talk] Effects of N2O Addition during the Growth of ZnO Films by Chemical Vapor Deposition Using a Catalytic Reaction
(Nagaoka U. Tech.) Tajima Ryouichi, Watanabe Koudai, Ono Shotarou, Kato Takahiro, *Yasui Kanji
chemical vapor deposition
catalytic reactions
ZnO films
K-2112
17:0017:20E225[Requested talk] Engineering Carbon Nanotube Synthesis: Catalyst Screening, Identification of Reactive Species, and Rational Reactor Design
(Waseda U.) (Ful)Noda Suguru
carbon nanotubes
chemical vapor deposition
rational design and development
K-219

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SCEJ 82nd Annual Meeting (Tokyo, 2017)


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