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SCEJ 85th Annual Meeting (2020)

Last modified: 2020-03-02 11:00:00

Program search result : Tsukune Atsuhiro : 1 program

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- The program for IChES 2020 is here

Authors field exact matches “Tsukune Atsuhiro”; 1 program is found.
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TimePaper
ID
Title / AuthorsKeywordsTopic codeAck.
number
Organized Session (CVD Reactions Section, Division of Chemical Reaction Engineering)
Day 3
13:0014:40
   Chair: Noda Suguru, Tsukune Atsuhiro
J313Theoretical study for modeling surface reactions on SiC-CVI process
CH3SiCl3
SiC CVI
surface reaction
5-h222
J314Time-evolution of film thickness profiles by level set method during CVD multiscale simulation
multiscale simulation
chemical vapor deposition
level set method
5-h462
J315Effects of dispersant for PECVD process with concurrent use of solid raw material upon synthesized composite thin films
titanium dioxide
carbon nanotube
photocatalyst
5-h572
J316Residual stress in gas barrier silica film prepared by plasma chemical vapor deposition
(Kyoto U.) *(Reg)Kawase M., (Stu)Hirata S., (Stu·PCEF)Wakisaka T.
CVD
residual stress
silica gas barrier film
5-h608
J317Development of methylammonium lead iodide perovskite film CVD process
CVD
methylammonium lead iodide
lead melt
5-h614
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SCEJ 85th Annual Meeting (2020)


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