Japanese page RELOAD
SCEJ 85th Annual Meeting (2020)
Last modified: 2020-03-02 11:00:00
Program search result : residual stress : 1 program
The preprints(abstracts) can be viewed by clicking the Paper IDs.
(The ID/PW are sent to the registered participants and invited persons.)
- The program for IChES 2020 is here
(The ID/PW are sent to the registered participants and invited persons.)
- The program for IChES 2020 is here
Keywords field exact matches “residual stress”; 1 program is found.
The search results are sorted by the start time.
| Time | Paper ID | Title / Authors | Keywords | Topic code | Ack. number |
|---|---|---|---|---|---|
| Day 3 | J316 | Residual stress in gas barrier silica film prepared by plasma chemical vapor deposition | CVD residual stress silica gas barrier film | 5-h | 608 |
Technical program
Technical sessions (Wide)
(For narrow screen)
Session programs
Search in technical program
SCEJ 85th Annual Meeting (2020)
© 2023 The Society of Chemical Engineers, Japan. All rights reserved.For more information contact Organizing Committee of SCEJ 85th Annual Meeting (2020) and IChES 2020
E-mail: inquiry-85a
www3.scej.org