Momose Takeshi - Program search result - SCEJ 82nd Annual Meeting (Tokyo, 2017)

`SCEJ 82nd Annual Meeting (Tokyo, 2017)`

Last modified: 2017-02-20 10:00:00

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Program search result : Momose Takeshi : 8 programs

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Authors field exact matches “Momose Takeshi”; 8 programs are found.
The search results are sorted by the start time.

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
Day 1 15:30– 16:00	B120	[Invited lecture] Thin film deposition using chemical reaction in supercritical fluid for high-aspect-ratio 3-dimensional features (U. Tokyo) (Ful)Momose Takeshi	Deposition Supercritical fluid Process development	K-1	335
Day 2 10:20– 10:40	E205	[Requested talk] Reaction Mechanism and Growth-rate Distribution in Metal-Organic Vapor-Phase Epitaxy of GaN (U. Tokyo) *(Ful)Sugiyama Masakazu, (Ful)Momose Takeshi, (Politecnico Di Milano) Ravasio Stefano, Cavallotti Carlo, (U. Tokyo) (Ful)Shimogaki Yukihiro	GaN MOVPE reaction mechanism	K-2	324
Day 2 10:20– 10:40	G205	3-demontional capacitor fabrication using supercritical fluid deposition (U. Tokyo) *(Stu)Zhao Yu, (Ful)Shimoyama Yusuke, (Ful)Momose Takeshi, (Ful)Shimogaki Yukihiro	supercritical fluid deposition 3-demontional capacitor	8-e	151
Day 2 13:00– 15:20	Chair: Momose Takeshi
	E213	[The SCEJ Award for Outstanding Asian Researcher and Engineer] Vapor-phase deposition of functional polymer films and their applications (KAIST) Im Sung Gap	initiated chemical vapor deposition functional polymer films electronic, separation, and biomedical applications	K-2	26
	E215	[Invited lecture] Application of Cat-CVD technology to crystalline silicon solar cells (JAIST) *Ohdaira Keisuke, Trinh Cham Thi, Oikawa Takafumi, Seto Junichi, Koyama Koichi, Matsumura Hideki	catalytic chemical vapor deposition crystalline Si solar cell passivation	K-2	85
	E217	[Requested talk] Synthesis of carbon nitride using microwave plasma CVD (Gifu U.) *Tanaka Ippei, (Chiba Inst. Tech.) Sakamoto Yukihiro	plasma CVD carbon nitride	K-2	477
	E218	[Requested talk] PEALD-TiO₂ films synthesized via CCRF discharges (Tokyo Electron Yamanashi) Iwashita Shinya	TiO2 PEALD deposition	K-2	217
	E219	[Requested talk] Surface coating of carbon nanotubes by aerosol process with plasma enhanced chemical vapor deposition (Hiroshima U.) *(Ful)Shimada Manabu, (Ful)Kubo Masaru, (Hiroshima U./ITS Surabaya) (Ful)Kusdianto K.	PECVD carbon nanotube dry coating process	K-2	396
Day 3 11:20– 11:40	G308	Ultra conformal infiltration achieved by optimal design of SiC-CVI process and the effect on composite material properties (U. Tokyo) *(Stu)Shima Kohei, (Stu)Sato Noboru, (Stu)Funato Yuichi, (Stu)Naka Tomoaki, (IHI) (Ful)Fukushima Yasuyuki, (U. Tokyo) (Ful)Momose Takeshi, (Ful)Shimogaki Yukihiro	CVD SiC CMC	5-h	552
Day 3 11:40– 12:00	G309	Construction of the overall reaction model for optimizing SiC-CVD using Methyltrichlorosilane(4) (U. Tokyo) *(Stu)Funato Yuichi, (Stu)Shima Kohei, (Stu)Sato Noboru, (Stu)Naka Tomoaki, (Ful)Fukushima Yasuyuki, (Ful)Momose Takeshi, (Ful)Shimogaki Yukihiro	SiC Reaction model CVD	5-h	664
Day 3 13:20– 15:20	PE383	Effects of HCl gas addition and high concentration precursor supply to SiC-CVI process aiming for uniform growth in multi-scale (U. Tokyo) *(Stu)Naka Tomoaki, (Stu)Shima Kohei, (Stu)Sato Noboru, (Stu)Funato Yuichi, (IHI) (Ful)Fukushima Yasuyuki, (U. Tokyo) (Ful)Momose Takeshi, (Ful)Shimogaki Yukihiro	CVD SiC	5-h	478
Day 3 13:20– 15:20	PE386	Synthesis and characterization of Ti_1-xAl_xN films by thermal CVD (U. Tokyo) *(Stu)Sato Hiroki, Hirabaru Tomoko, (Kyocera) Kubo Hayato, (U. Tokyo) (Ful)Momose Takeshi, (Kyocera) Tanibuchi Takahito, (U. Tokyo) (Ful)Shimogaki Yukihiro	CVD coating TiAlN	5-h	321

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SCEJ 82nd Annual Meeting (Tokyo, 2017)

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