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SCEJ 82nd Annual Meeting (Tokyo, 2017)

Last modified: 2017-02-20 10:00:00

Program search result : Shimogaki Yukihiro : 7 programs

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Authors field exact matches “Shimogaki Yukihiro”; 7 programs are found.
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TimePaper
ID
Title / AuthorsKeywordsTopic codeAck.
number
Day 2
9:009:40
E201[Invited lecture] Analysis and Design of CVD/ALD processes Based on Chemical Reaction Engineering
(U. Tokyo) (Ful)Shimogaki Yukihiro
Chemical Reaction Engineering
CVD
Process Design
K-2838
Day 2
10:2010:40
E205[Requested talk] Reaction Mechanism and Growth-rate Distribution in Metal-Organic Vapor-Phase Epitaxy of GaN
(U. Tokyo) *(Ful)Sugiyama Masakazu, (Ful)Momose Takeshi, (Politecnico Di Milano) Ravasio Stefano, Cavallotti Carlo, (U. Tokyo) (Ful)Shimogaki Yukihiro
GaN
MOVPE
reaction mechanism
K-2324
Day 2
10:2010:40
G2053-demontional capacitor fabrication using supercritical fluid deposition
(U. Tokyo) *(Stu)Zhao Yu, (Ful)Shimoyama Yusuke, (Ful)Momose Takeshi, (Ful)Shimogaki Yukihiro
supercritical fluid deposition
3-demontional
capacitor
8-e151
Day 3
11:2011:40
G308Ultra conformal infiltration achieved by optimal design of SiC-CVI process and the effect on composite material properties
(U. Tokyo) *(Stu)Shima Kohei, (Stu)Sato Noboru, (Stu)Funato Yuichi, (Stu)Naka Tomoaki, (IHI) (Ful)Fukushima Yasuyuki, (U. Tokyo) (Ful)Momose Takeshi, (Ful)Shimogaki Yukihiro
CVD
SiC
CMC
5-h552
Day 3
11:4012:00
G309Construction of the overall reaction model for optimizing SiC-CVD using Methyltrichlorosilane(4)
(U. Tokyo) *(Stu)Funato Yuichi, (Stu)Shima Kohei, (Stu)Sato Noboru, (Stu)Naka Tomoaki, (Ful)Fukushima Yasuyuki, (Ful)Momose Takeshi, (Ful)Shimogaki Yukihiro
SiC
Reaction model
CVD
5-h664
Day 3
13:2015:20
PE383Effects of HCl gas addition and high concentration precursor supply to SiC-CVI process aiming for uniform growth in multi-scale
(U. Tokyo) *(Stu)Naka Tomoaki, (Stu)Shima Kohei, (Stu)Sato Noboru, (Stu)Funato Yuichi, (IHI) (Ful)Fukushima Yasuyuki, (U. Tokyo) (Ful)Momose Takeshi, (Ful)Shimogaki Yukihiro
CVD
SiC
5-h478
Day 3
13:2015:20
PE386Synthesis and characterization of Ti1-xAlxN films by thermal CVD
(U. Tokyo) *(Stu)Sato Hiroki, Hirabaru Tomoko, (Kyocera) Kubo Hayato, (U. Tokyo) (Ful)Momose Takeshi, (Kyocera) Tanibuchi Takahito, (U. Tokyo) (Ful)Shimogaki Yukihiro
CVD
coating
TiAlN
5-h321

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SCEJ 82nd Annual Meeting (Tokyo, 2017)


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