Japanese page RELOAD
SCEJ

SCEJ 86th Annual Meeting (2021)

Program search result : SiC : 3 programs

The preprints(abstracts) are now open (Mar. 8th). These can be viewed by clicking the Paper IDs. The ID/PW sent to the Registered participants (excludes free registration) and invited persons are required.

Keywords field exact matches “SiC”; 3 programs are found.
The search results are sorted by the start time.

TimePaper
ID
Title / AuthorsKeywordsTopic codeAck.
number
Day 1
14:2015:20
PA128Development of chlorine-free SiC-CVI process to achieve uniform infiltration without particle generation
SiC
CVI
CVD
5-h506
Day 1
16:2016:40
N123ClF3 gas distributor design for SiC wafer etching
SiC
Wafer etching
CLF3 gas
11-c43
Day 3
14:2014:40
K317Conformal growth of SiC onto trenches by CVI from MTS/H2 with using quasi-0th-order reaction and sacrificial layer
SiC
CVD
CVI
5-h383
DispCtl: Preferences

Technical program
Technical sessions (Wide)  (For narrow screen)
Session programs
Search in technical program
SCEJ 86th Annual Meeting (2021)


© 2023 The Society of Chemical Engineers, Japan. All rights reserved.
For more information contact Organizing Committee of SCEJ 86th Annual Meeting (2021) and IChES 2021
E-mail: inquiry-86awww3.scej.org