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SCEJ 88th Annual Meeting (Tokyo, 2023)

Program search result : 西田 哲 : 2 programs

The preprints(abstracts) are now open (Mar. 1st). These can be viewed by clicking the Paper IDs. The ID/PW sent to the Registered participants in Period I/II and invited persons are required.

Authors and Chairs (J) field exact matches “西田 哲”; 2 programs are found.
The search results are sorted by the start time.

TimePaper
ID
Title / AuthorsKeywordsTopic codeAck.
number
Organized Session (CVD Reactions Section, Division of Chemical Reaction Engineering)
Day 1
13:0014:20
   Chair: Nishida Satoshi, Shimizu Hideharu
F113Chemical Vapor Deposition Rate Control of Bismuth-based Perovskite Thin Film for Photovoltaic Performances Improvement
(Kyoto U.) *(Int)Yang Ziguang, (Stu)Togami Keito, (Stu)Tanabe Maika, (Reg)Kawase Motoaki
Chemical vapor deposition
Methylammonium bismuth iodide
Molten bismuth
5-h554
F114The coke deposition rate from paraffins and olefins
(Kyoto U.) *(Stu)Nakano Shinji, (Reg)Fujitsuka Hiroyasu, (Reg)Kawase Motoaki
fouling
coking
CVD
5-h528
F115Aluminum nitride film production by chemical vapor deposition from triethylaluminum
(Kyoto U.) *(Stu)Murahashi Kousuke, (Stu)Li Yafei, (Reg)Kawase Motoaki
CVD
triethylaluminum
AlN
5-h540
F116Molecular Simulation Study on Effect of Group-III Precursors on III-V Compound Crystal Growth
(Kyoto U.) *(Stu)Li Yafei, (Stu)Murahashi Kousuke, (Reg)Kawase Motoaki
MOCVD
molecular simulations
III-V compound
5-h547
Day 3
9:2010:20
PD363Formation of texture on silicon substrates by alkaline etching, and evaluation of the texture
(Gifu U.) *(Stu)Nakagawa Masato, Komiyama Masaharu, (Reg)Nishida Satoshi
alkaline etching
silicon substrates
texture
5-h312

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SCEJ 88th Annual Meeting (Tokyo, 2023)


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