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SCEJ 88th Annual Meeting (Tokyo, 2023)

Program search result : 5-h : 14 programs

The preprints(abstracts) are now open (Mar. 1st). These can be viewed by clicking the Paper IDs. The ID/PW sent to the Registered participants in Period I/II and invited persons are required.

Topics Code field begins with “5-h”; 14 programs are found.
The search results are sorted by the start time.

TimePaper
ID
Title / AuthorsKeywordsTopic codeAck.
number
Day 1
13:0013:20
F113Chemical Vapor Deposition Rate Control of Bismuth-based Perovskite Thin Film for Photovoltaic Performances Improvement
Chemical vapor deposition
Methylammonium bismuth iodide
Molten bismuth
5-h554
Day 1
13:2013:40
F114The coke deposition rate from paraffins and olefins
fouling
coking
CVD
5-h528
Day 1
13:4014:00
F115Aluminum nitride film production by chemical vapor deposition from triethylaluminum
CVD
triethylaluminum
AlN
5-h540
Day 1
14:0014:20
F116Molecular Simulation Study on Effect of Group-III Precursors on III-V Compound Crystal Growth
MOCVD
molecular simulations
III-V compound
5-h547
Day 1
14:4015:00
F118CVD process from dichlorosilane, boron trichloride and monomethylsilane gases
dihlorosilane
boron trichloride
monomethylsilane
5-h7
Day 1
15:0015:20
F119Refinement of surface reaction mechanism of SiC-CVI based on theoretical study
SiC
CVI
surface reaction model
5-h245
Day 1
15:2015:40
F120In-situ visible light reflectance observation method for designing Co-ALD process with high substrate selectivity.
ALD
in-situ observation
reflectance
5-h597
Day 1
16:0016:20
F122Density Function Theory Study of Copper bis(2,2,6,6-tetramethyl-3,5-heptanedionate) Adsorption on Cu (111) surface
Atomic Layer Depositon
Density Function Theory
Surface Adsorption
5-h217
Day 1
16:2016:40
F123Investigation on pretreatment conditions for low-resistivity copper film formation on dielectrics using supercritical fluid deposition
SCFD
Polymer
resistivity
5-h705
Day 3
9:2010:20
PD357Synthesis of boron nitride nanotubes using boric acid as a boron source
Boron nitride nanotube
Chemical vapor deposition
Template coating
5-h79
Day 3
9:2010:20
PD363Formation of texture on silicon substrates by alkaline etching, and evaluation of the texture
alkaline etching
silicon substrates
texture
5-h312
Day 3
9:2010:20
PD373Study of Co deposition with Atomic Layer Deposition on an ultra light-weight X-ray telescope
Atomic Layer Deposition
micropore optics
x-ray
5-h516
Day 3
10:2011:20
PD372Fabrication of mono-crystalline Si film on porous Si by rapid vapor deposition method
(Waseda U.) *(Stu·PCEF)Ohashi Misako, (Reg)Osawa Toshio, (Reg)Noda Suguru
Mono-crystalline Si film
Rapid vapor deposition
Porous Si
5-h157
Day 3
10:2011:20
PD376CFD simulation of CVD reactors in the CH3SiCl3(MTS)/H2 system using a simple SiC growth model
CVD
MTS
CFD
5-h676
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SCEJ 88th Annual Meeting (Tokyo, 2023)


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