ST-25 - Program search result - SCEJ 50th Autumn Meeting (Kagoshima, 2018)

`SCEJ 50th Autumn Meeting (Kagoshima, 2018)`

Last modified: 2018-09-04 10:00:00

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Program search result : ST-25 : 19 programs

The abstracts can be viewed by clicking the Paper IDs.
The ID/PW printed on the PROGRAM book are required.
(The ID/PW have also been sent to the Earlybird registers and invited persons by e-mail.)

Topics Code field begins with “ST-25”; 19 programs are found. (“Poster with Flash” presentations are double-counted.)
The search results are sorted by the start time.

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
Day 2 13:00– 13:40	CD213	[Review lecture] Development and prospects of hard coating for cutting tool using thermal CVD method (Kyocera) (Cor)Tanibuchi Takahito	CVD Cutting tool Hard coating	ST-25	468
Day 2 13:40– 14:00	CD215	New alumina CVD process from alkyl aluminum (Kyoto U.) *(Stu·PCEF)Nakamura Takumi, (Stu)Inokuti Kazuaki, (Stu)Nagata Kakeru, (Stu)Yakabi Ryo, (Reg)Kawase Motoaki	CVD alkyl aluminum alumina	ST-25	882
Day 2 14:00– 14:20	CD216	Synthesis of Al-rich fcc-TiAlN by thermal CVD (2) (U. Tokyo) *(Stu)Yamaguchi Jun, Hirabaru Tomoko, (Kyocera) (Cor)Kubo Hayato, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Kyocera) (Cor)Tanibuchi Takahito, (U. Tokyo) (Reg)Shimogaki Yukihiro	CVD TiAlN cutting tool	ST-25	561
Day 2 14:20– 14:40	CD217	Investigation of trench-filling mechanism and the effect of adding HCl during 4H-SiC CVD (AIST) *(Reg)Mochizuki Kazuhiro, Ji Shiyang, Adachi Kohei, Kosugi Ryoji, Yonezawa Yoshiyuki, Okumura Hajime	4H-SiC trench filling HCl	ST-25	142
Day 2 14:40– 15:00	CD218	Theoretical study of surface reaction process on SiC-CVI process (U. Tokyo) *(Stu)Sato Noboru, (Reg)Naka Tomoaki, (Stu)Kondo Yoshifumi, (Reg)Funato Yuichi, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro	SiC CVI Surface Reaction	ST-25	919
Day 3 9:00– 9:20	CD301	Guideline for uniform Cu film fabrication on high aspect ratio structure by supercritical fluid deposition (U. Tokyo) *(Stu)Fujita Shotaro, (Reg)Deura Momoko, (Tokyo Tech) (Reg)Shimoyama Yusuke, (U. Tokyo) (Reg)Shimogaki Yukihiro, (Reg)Momose Takeshi	Supercritical fluid deposition Diffusion coefficient Kinetics	ST-25	905
Day 3 9:20– 9:40	CD302	Supercritical dying and impregnation for fabrication of porous carbon electrode on Li-O₂/CO₂ battery (Tokyo Tech) *(Stu)Kunanusont N., (Reg)Shimoyama Y.	Li- O2/CO2 battery supercritical carbon dioxide ionogel binder	ST-25	685
Day 3 9:40– 10:00	CD303	Tetracene thin film formation for organic photovoltaics by temperature-driven supercritical fluid deposition (U. Tokyo) *(Stu)Lee Yanshao, (Reg)Deura Momoko, (Tokyo Tech) (Reg)Shimoyama Yusuke, (U. Tokyo) (Reg)Shimogaki Yukihiro, (Reg)Momose Takeshi	Temperature-driven Supercritical Fluid Deposition Crystallization Tetracene	ST-25	1058
Day 3 10:00– 10:20	CD304	[Invited lecture] CVD growth and growth mechanisms of graphene and related two-dimensional materials (Kyushu U./AIST) Ago Hiroki	graphene epitaxial growth hexagonal boron nitride	ST-25	44
Day 3 10:20– 10:40	CD305	Effect of hydrogen sulfide on pyrolyitic carbon CVD (Kyoto U.) *(Stu·PCEF)Makino Yusaku, (Reg)Kawase Motoaki	CVD Carbon Hydrogen sulfide	ST-25	978
Day 3 10:40– 11:00	CD306	Flame-assisted spray synthesis of Cs_xWO₃ nanoparticles and their optical properties (Hiroshima U.) *(Stu)Hirano Tomoyuki, Nakakura Shuhei, (Stu)Rinaldi Febrigia Ghana, (Reg·APCE)Ogi Takashi	cesium tungsten bronze flame-assisted spray pyrolysis aerosol	ST-25	113
Day 3 11:00– 11:20	CD307	Temperature field control of catalyst formation for gas-phase synthesis of single-wall carbon nanotubes (Waseda U.) *(Stu)Namiki Katsuya, (Reg)Sugime Hisashi, (Reg)Ohsawa Toshio, (Reg)Noda Suguru	single-wall carbon nanotube reaction field control floating catalyst chemical vapor deposition	ST-25	336
Day 3 11:20– 11:40	CD308	Study on reaction mechanism for fabricating high quality zinc oxide thin film by Mist CVD (Kochi U. Tech.) *(Stu)Nishi Misaki, Hasegawa Ryou, Yasuoka Tatsuya, Ueda Mariko, Sakamoto Masahito, Satou Shouta, Phimolphan Ruttongja, Liu Li, Dang. T Gian, Kawaharamura Toshiyuki	Mist CVD ZnO reaction mechanism	ST-25	879
Day 3 11:40– 12:00	CD309	Lithium-doped Zinc Oxide thin film's relative permittivity by LPCVD Method (Tokai U.) *(Stu)Takemoto Satoshi, (Reg)Akiyama Yasunobu	CVD Lithium-doped Zinc Oxide Ferroelectric	ST-25	832
Day 3 13:00– 13:40	CD313	[Review lecture] Thin film deposition and surface modification using species generated by catalytic decomposed reaction: Foundations and applications of HWCVD method (Kyutech) Izumi Akira	HWCVD Thin film Surface modification	ST-25	243
Day 3 13:40– 14:00	CD315	Analysis of reaction kinetics of SiO₂ atomic layer deposition with aminosilane-gases (TTS) *(Reg)Kawakami M., Kagaya M., Mitsunari T., Sato J., Yabe K.	ALD aminosilane reaction kinetics	ST-25	226
Day 3 14:00– 14:20	CD316	[Invited lecture] Interface level formation at SiO₂/Si by plasma etching (Sony Semiconductor Manufacturing) *Nagahata Kazunori, Shigetoshi Takushi	Plasma Etching Damage	ST-25	330
Day 3 14:20– 14:40	CD317	Preparation and evaluation of TiB based films by RF plasma CVD (Osaka Pref. U.) *(Stu)Kiyokawa Daichi, Fuji Kazuki, (Reg)Okamoto Naoki, (Reg)Saito Takeyasu	hard coating plasma CVD TiBCN	ST-25	937
Day 3 14:40– 15:00	CD318	Photocatalytic activity of composite thin films prepared by deposition of Ag and TiO₂ particles under visible light irradiation (Hiroshima U.) *(Stu·PCEF)Masaki Yuya, Jiang Dianping, (Reg)Kubo Masaru, (Reg)Shimada Manabu, (Hiroshima U./ITS Surabaya) (Reg)Kusdianto K.	PVD PECVD nanoparticle	ST-25	576

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SCEJ 50th Autumn Meeting (Kagoshima, 2018)

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