ST-25 - Session programs - SCEJ 50th Autumn Meeting (Kagoshima, 2018)

`SCEJ 50th Autumn Meeting (Kagoshima, 2018)`

Last modified: 2018-09-04 10:00:00

Meeting Info.
Program
- Program Menu
- Tech. Sessions
- narrow view
- Day 1
- Day 2
- Day 3
By Session
- Session list
- SV: Vison Symp.
  - SV-1
- SP: Spec.Symp.
  - SP-1
  - SP-2
  - SP-3
  - SP-4
- HQ: Hq.,etc.
  - HQ-11
  - HQ-12
- ST:(21-33)
  - ST-21
  - ST-22
  - ST-23
  - ST-24
  - ST-25
  - ST-26
  - ST-27
  - ST-28
  - ST-29
  - ST-30
  - ST-31
  - ST-32
  - ST-33
- SY:(51-59)
  - SY-51
  - SY-52
  - SY-53
  - SY-54
  - SY-55
  - SY-56
  - SY-57
  - SY-58
  - SY-59
- SY:(60-69)
  - SY-60
  - SY-61
  - SY-62
  - SY-63
  - SY-64
  - SY-65
  - SY-66
  - SY-67
  - SY-68
  - SY-69
- SY:(70-79)
  - SY-70
  - SY-71
  - SY-72
  - SY-73
  - SY-74
  - SY-75
  - SY-76
  - SY-77
  - SY-78
  - SY-79
- SY:(80-85)
  - SY-80
  - SY-81
  - SY-82
  - SY-83
  - SY-84
  - SY-85
- Ceremony
  - Ceremony
By Hall
Search/Index

Session programs : ST-25

The abstracts can be viewed by clicking the Paper IDs.
The ID/PW printed on the PROGRAM book are required.
(The ID/PW have also been sent to the Earlybird registers and invited persons by e-mail.)

ST-25 [Trans-Division Symposium]
CVD and Dry Process

Organizers:

Akiyama Yasunobu (Tokai Univ.), Tsukune Atsuhiro (Taiyo Nippon Sanso), Noda Suguru (Waseda Univ.)

Hall CD, Day 2 | Hall CD, Day 3

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
Hall CD(Bldg. "Lecture Room & Student Office", Faculty of Engineering 3F 302), Day 2(Sep. 19)
(13:00–14:00) (Chair: Shimogaki Yukihiro)
13:00– 13:40	CD213	[Review lecture] Development and prospects of hard coating for cutting tool using thermal CVD method (Kyocera) (Cor)Tanibuchi Takahito	CVD Cutting tool Hard coating	ST-25	468
13:40– 14:00	CD215	New alumina CVD process from alkyl aluminum (Kyoto U.) *(Stu·PCEF)Nakamura Takumi, (Stu)Inokuti Kazuaki, (Stu)Nagata Kakeru, (Stu)Yakabi Ryo, (Reg)Kawase Motoaki	CVD alkyl aluminum alumina	ST-25	882
(14:00–15:00) (Chair: Shimoyama Yusuke)
14:00– 14:20	CD216	Synthesis of Al-rich fcc-TiAlN by thermal CVD (2) (U. Tokyo) *(Stu)Yamaguchi Jun, Hirabaru Tomoko, (Kyocera) (Cor)Kubo Hayato, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Kyocera) (Cor)Tanibuchi Takahito, (U. Tokyo) (Reg)Shimogaki Yukihiro	CVD TiAlN cutting tool	ST-25	561
14:20– 14:40	CD217	Investigation of trench-filling mechanism and the effect of adding HCl during 4H-SiC CVD (AIST) *(Reg)Mochizuki Kazuhiro, Ji Shiyang, Adachi Kohei, Kosugi Ryoji, Yonezawa Yoshiyuki, Okumura Hajime	4H-SiC trench filling HCl	ST-25	142
14:40– 15:00	CD218	Theoretical study of surface reaction process on SiC-CVI process (U. Tokyo) *(Stu)Sato Noboru, (Reg)Naka Tomoaki, (Stu)Kondo Yoshifumi, (Reg)Funato Yuichi, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro	SiC CVI Surface Reaction	ST-25	919
Hall CD(Bldg. "Lecture Room & Student Office", Faculty of Engineering 3F 302), Day 3(Sep. 20)
(9:00–10:00) (Chair: Kawakami Masato)
9:00– 9:20	CD301	Guideline for uniform Cu film fabrication on high aspect ratio structure by supercritical fluid deposition (U. Tokyo) *(Stu)Fujita Shotaro, (Reg)Deura Momoko, (Tokyo Tech) (Reg)Shimoyama Yusuke, (U. Tokyo) (Reg)Shimogaki Yukihiro, (Reg)Momose Takeshi	Supercritical fluid deposition Diffusion coefficient Kinetics	ST-25	905
9:20– 9:40	CD302	Supercritical dying and impregnation for fabrication of porous carbon electrode on Li-O₂/CO₂ battery (Tokyo Tech) *(Stu)Kunanusont N., (Reg)Shimoyama Y.	Li- O2/CO2 battery supercritical carbon dioxide ionogel binder	ST-25	685
9:40– 10:00	CD303	Tetracene thin film formation for organic photovoltaics by temperature-driven supercritical fluid deposition (U. Tokyo) *(Stu)Lee Yanshao, (Reg)Deura Momoko, (Tokyo Tech) (Reg)Shimoyama Yusuke, (U. Tokyo) (Reg)Shimogaki Yukihiro, (Reg)Momose Takeshi	Temperature-driven Supercritical Fluid Deposition Crystallization Tetracene	ST-25	1058
(10:00–11:00) (Chair: Noda Suguru)
10:00– 10:20	CD304	[Invited lecture] CVD growth and growth mechanisms of graphene and related two-dimensional materials (Kyushu U./AIST) Ago Hiroki	graphene epitaxial growth hexagonal boron nitride	ST-25	44
10:20– 10:40	CD305	Effect of hydrogen sulfide on pyrolyitic carbon CVD (Kyoto U.) *(Stu·PCEF)Makino Yusaku, (Reg)Kawase Motoaki	CVD Carbon Hydrogen sulfide	ST-25	978
10:40– 11:00	CD306	Flame-assisted spray synthesis of Cs_xWO₃ nanoparticles and their optical properties (Hiroshima U.) *(Stu)Hirano Tomoyuki, Nakakura Shuhei, (Stu)Rinaldi Febrigia Ghana, (Reg·APCE)Ogi Takashi	cesium tungsten bronze flame-assisted spray pyrolysis aerosol	ST-25	113
(11:00–12:00) (Chair: Shimada Manabu)
11:00– 11:20	CD307	Temperature field control of catalyst formation for gas-phase synthesis of single-wall carbon nanotubes (Waseda U.) *(Stu)Namiki Katsuya, (Reg)Sugime Hisashi, (Reg)Ohsawa Toshio, (Reg)Noda Suguru	single-wall carbon nanotube reaction field control floating catalyst chemical vapor deposition	ST-25	336
11:20– 11:40	CD308	Study on reaction mechanism for fabricating high quality zinc oxide thin film by Mist CVD (Kochi U. Tech.) *(Stu)Nishi Misaki, Hasegawa Ryou, Yasuoka Tatsuya, Ueda Mariko, Sakamoto Masahito, Satou Shouta, Phimolphan Ruttongja, Liu Li, Dang. T Gian, Kawaharamura Toshiyuki	Mist CVD ZnO reaction mechanism	ST-25	879
11:40– 12:00	CD309	Lithium-doped Zinc Oxide thin film's relative permittivity by LPCVD Method (Tokai U.) *(Stu)Takemoto Satoshi, (Reg)Akiyama Yasunobu	CVD Lithium-doped Zinc Oxide Ferroelectric	ST-25	832
(13:00–14:00) (Chair: Akiyama Yasunobu)
13:00– 13:40	CD313	[Review lecture] Thin film deposition and surface modification using species generated by catalytic decomposed reaction: Foundations and applications of HWCVD method (Kyutech) Izumi Akira	HWCVD Thin film Surface modification	ST-25	243
13:40– 14:00	CD315	Analysis of reaction kinetics of SiO₂ atomic layer deposition with aminosilane-gases (TTS) *(Reg)Kawakami M., Kagaya M., Mitsunari T., Sato J., Yabe K.	ALD aminosilane reaction kinetics	ST-25	226
(14:00–15:00) (Chair: Tsukune Atsuhiro)
14:00– 14:20	CD316	[Invited lecture] Interface level formation at SiO₂/Si by plasma etching (Sony Semiconductor Manufacturing) *Nagahata Kazunori, Shigetoshi Takushi	Plasma Etching Damage	ST-25	330
14:20– 14:40	CD317	Preparation and evaluation of TiB based films by RF plasma CVD (Osaka Pref. U.) *(Stu)Kiyokawa Daichi, Fuji Kazuki, (Reg)Okamoto Naoki, (Reg)Saito Takeyasu	hard coating plasma CVD TiBCN	ST-25	937
14:40– 15:00	CD318	Photocatalytic activity of composite thin films prepared by deposition of Ag and TiO₂ particles under visible light irradiation (Hiroshima U.) *(Stu·PCEF)Masaki Yuya, Jiang Dianping, (Reg)Kubo Masaru, (Reg)Shimada Manabu, (Hiroshima U./ITS Surabaya) (Reg)Kusdianto K.	PVD PECVD nanoparticle	ST-25	576

Technical program
Technical sessions (Wide) (For narrow screen)
Session programs
Search in technical program
SCEJ 50th Autumn Meeting (Kagoshima, 2018)

www3.scej.org

SCEJ 50th Autumn Meeting (Kagoshima, 2018)

Session programs : ST-25

ST-25 [Trans-Division Symposium] CVD and Dry Process

`SCEJ 50th Autumn Meeting (Kagoshima, 2018)`

ST-25 [Trans-Division Symposium]
CVD and Dry Process