Japanese page RELOAD
SCEJ 50th Autumn Meeting (Kagoshima, 2018)
Last modified: 2018-09-04 10:00:00
Program search result : Tsukune Atsuhiro : 1 program
The abstracts can be viewed by clicking the Paper IDs.
The ID/PW printed on the PROGRAM book are required.
(The ID/PW have also been sent to the Earlybird registers and invited persons by e-mail.)
The ID/PW printed on the PROGRAM book are required.
(The ID/PW have also been sent to the Earlybird registers and invited persons by e-mail.)
Authors field exact matches “Tsukune Atsuhiro”; 1 program is found.
The search results are sorted by the start time.
| Time | Paper ID | Title / Authors | Keywords | Topic code | Ack. number |
|---|---|---|---|---|---|
| Day 3 | Chair: | ||||
| CD316 | [Invited lecture] Interface level formation at SiO2/Si by plasma etching | Plasma Etching Damage | ST-25 | 330 | |
| CD317 | Preparation and evaluation of TiB based films by RF plasma CVD | hard coating plasma CVD TiBCN | ST-25 | 937 | |
| CD318 | Photocatalytic activity of composite thin films prepared by deposition of Ag and TiO2 particles under visible light irradiation | PVD PECVD nanoparticle | ST-25 | 576 | |
Technical program
Technical sessions (Wide)
(For narrow screen)
Session programs
Search in technical program
SCEJ 50th Autumn Meeting (Kagoshima, 2018)
© 2023 The Society of Chemical Engineers, Japan. All rights reserved.For more information contact SCEJ 50th Autumn Meeting Organizing Committee
E-mail: inquiry-50f
www3.scej.org