Last modified: 2018-09-04 10:00:00
Time | Paper ID | Title / Authors | Keywords | Topic code | Ack. number |
---|---|---|---|---|---|
ST-25 [Trans-Division Symposium] CVD and Dry Process | |||||
(9:00–10:00) (Chair: | |||||
CD301 | Guideline for uniform Cu film fabrication on high aspect ratio structure by supercritical fluid deposition | Supercritical fluid deposition Diffusion coefficient Kinetics | ST-25 | 905 | |
CD302 | Supercritical dying and impregnation for fabrication of porous carbon electrode on Li-O2/CO2 battery | Li- O2/CO2 battery supercritical carbon dioxide ionogel binder | ST-25 | 685 | |
CD303 | Tetracene thin film formation for organic photovoltaics by temperature-driven supercritical fluid deposition | Temperature-driven Supercritical Fluid Deposition Crystallization Tetracene | ST-25 | 1058 | |
(10:00–11:00) (Chair: | |||||
CD304 | [Invited lecture] CVD growth and growth mechanisms of graphene and related two-dimensional materials | graphene epitaxial growth hexagonal boron nitride | ST-25 | 44 | |
CD305 | Effect of hydrogen sulfide on pyrolyitic carbon CVD | CVD Carbon Hydrogen sulfide | ST-25 | 978 | |
CD306 | Flame-assisted spray synthesis of CsxWO3 nanoparticles and their optical properties | cesium tungsten bronze flame-assisted spray pyrolysis aerosol | ST-25 | 113 | |
(11:00–12:00) (Chair: | |||||
CD307 | Temperature field control of catalyst formation for gas-phase synthesis of single-wall carbon nanotubes | single-wall carbon nanotube reaction field control floating catalyst chemical vapor deposition | ST-25 | 336 | |
CD308 | Study on reaction mechanism for fabricating high quality zinc oxide thin film by Mist CVD | Mist CVD ZnO reaction mechanism | ST-25 | 879 | |
CD309 | Lithium-doped Zinc Oxide thin film's relative permittivity by LPCVD Method | CVD Lithium-doped Zinc Oxide Ferroelectric | ST-25 | 832 | |
(13:00–14:00) (Chair: | |||||
CD313 | [Review lecture] Thin film deposition and surface modification using species generated by catalytic decomposed reaction: Foundations and applications of HWCVD method | HWCVD Thin film Surface modification | ST-25 | 243 | |
CD315 | Analysis of reaction kinetics of SiO2 atomic layer deposition with aminosilane-gases | ALD aminosilane reaction kinetics | ST-25 | 226 | |
(14:00–15:00) (Chair: | |||||
CD316 | [Invited lecture] Interface level formation at SiO2/Si by plasma etching | Plasma Etching Damage | ST-25 | 330 | |
CD317 | Preparation and evaluation of TiB based films by RF plasma CVD | hard coating plasma CVD TiBCN | ST-25 | 937 | |
CD318 | Photocatalytic activity of composite thin films prepared by deposition of Ag and TiO2 particles under visible light irradiation | PVD PECVD nanoparticle | ST-25 | 576 |
Technical program
Technical sessions (Wide)
(For narrow screen)
Session programs
Search in technical program
SCEJ 50th Autumn Meeting (Kagoshima, 2018)