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SCEJ 51st Autumn Meeting (2020)

Program search result : ドライ : 5 programs

All sessions can be attended from the On-line (Virtual) Meeting Site.
Preprints(Abstracts) are now open. Click the Paper IDs. (Registered participants and invited persons only)
The ID/PW was sent on Sept. 10 (for earlybird registered participants) or on Sept. 23 (for on-site registered participants).
(Aug. 8) Flash session of SY-69 has been cancelled.
(Aug. 24,27) Schedule of SY-74 (X306, X307) and HQ-11 (D301) has been changed.

Title (J) field includes “ドライ”; 5 programs are found. (“Poster with Flash” presentations are double-counted.)
The search results are sorted by the start time.

TimePaper
ID
Title / AuthorsKeywordsTopic codeAck.
number
Day 1
9:0010:30
PA108CH4 dry reforming process with capturing solid carbon from CO2: intensification of carbon capturing rate
(Shizuoka U.) *(Stu·PCEF)Tanebayashi Masaki, (PCEF)Matsui Yoshito, (Reg)Watanabe Ryo, (Reg)Fukuhara Choji
Methane dry reforming
Carbon capture
Structured catalyst
SY-64575
Day 1
9:0010:30
PA127Catalyst development for dry reforming of methane using Pd membrane reactor
(Gifu U.) *(Stu)Katou Souichirou, (Reg)Miyamoto Manabu, (Reg)Oumi Yasunori, (Reg)Uemiya Shigeyuki
membrane reactor
oxygen storage capacity
catalyst
SY-64293
Day 1
12:4013:40
PA108CH4 dry reforming process with capturing solid carbon from CO2: intensification of carbon capturing rate
(Shizuoka U.) *(Stu·PCEF)Tanebayashi Masaki, (PCEF)Matsui Yoshito, (Reg)Watanabe Ryo, (Reg)Fukuhara Choji
Methane dry reforming
Carbon capture
Structured catalyst
SY-64575
Day 1
13:4014:40
PA127Catalyst development for dry reforming of methane using Pd membrane reactor
(Gifu U.) *(Stu)Katou Souichirou, (Reg)Miyamoto Manabu, (Reg)Oumi Yasunori, (Reg)Uemiya Shigeyuki
membrane reactor
oxygen storage capacity
catalyst
SY-64293
Day 3
13:0013:20
K313[Invited lecture] Characterization of silicon and nitrogen doped diamond-like carbon thin films prepared by plasma-enhanced chemical vapor deposition
(Hirosaki U.) Nakazawa Hideki
diamond-like carbon
plasma-enhanced chemical vapor deposition
silicon
ST-22248

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SCEJ 51st Autumn Meeting (2020)


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