Hall K, Day 2 - Hall and day program - SCEJ 51st Autumn Meeting (2020)

`SCEJ 51st Autumn Meeting (2020)`

Last modified: 2023-05-16 19:47:30

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Hall and day program : Hall K, Day 2

All sessions can be attended from the On-line (Virtual) Meeting Site.
Preprints(Abstracts) are now open. Click the Paper IDs. (Registered participants and invited persons only)
The ID/PW was sent on Sept. 10 (for earlybird registered participants) or on Sept. 23 (for on-site registered participants).
(Aug. 8) Flash session of SY-69 has been cancelled.
(Aug. 24,27) Schedule of SY-74 (X306, X307) and HQ-11 (D301) has been changed.

Hall K(), Day 2(Sep. 25)

ST-22

Time	Paper ID	Title / Authors	Keywords	Topic code	Ack. number
ST-22 [Trans-Division Symposium] CVD and Dry Processes
(9:20–10:20) (Chair: Mori Shinsuke)
9:20– 9:40	K202	Effects of dispersant for PECVD process with concurrent use of solid raw material upon synthesized composite thin films (Hiroshima U.) *(Reg)Shimada Manabu, (PCEF)Takahashi Kazuma, (Reg)Kubo Masaru	titanium dioxide carbon nanotube photocatalyst	ST-22	213
9:40– 10:00	K203	Preparation of nanostructured particles using direct spray type tubular flames (Hiroshima U.) *(Stu)Hirano Tomoyuki, (Reg·APCE)Ogi Takashi	Nanostructured particle Flame spray pyrolysis Tubular flame	ST-22	55
10:00– 10:20	K204	Synthesis of metal particles by tubular flames (Hiroshima U.) *(Stu)Kikkawa Jun, (Stu)Hirano Tomoyuki, (Reg·APCE)Ogi Takashi	Metal particles Flame spray pyrolysis Tubular flame	ST-22	174
10:20– 10:40		Break
(10:40–12:00) (Chair: Shimada Manabu)
10:40– 11:00	K206	Effects of the central metals of perovskite thin film on structure (Kyoto U.) *(Stu·PCEF)Matsuda Megumi, (Stu)Murakami Takanori, (Stu)Matsumura Nanzuki, (Reg)Kawase Motoaki	CVD perovskite central metals	ST-22	414
11:00– 11:20	K207	Highly-loaded Ni on CeO₂ prepared by flame spray pyrolysis (Yamagata U.) (Reg)Fujiwara Kakeru	Ni CeO2 Flame spray pyrolysis	ST-22	686
11:20– 12:00	K208	[Review lecture] Future Prospects of Plasma Deposition Technology (Tohoku U. NICHe) Goto Tetsuya	plasma enhanced deposition plasma equipment design reactive species control	ST-22	110
(13:00–14:20) (Chair: Nishida Satoshi)
13:00– 13:20	K213	[Invited lecture] A new HVPE growth technique which brings high quality GaN substrates; maskless-3D (Sciocs) Yoshida Takehiro	GaN substrate, HVPE low dislocation density	ST-22	112
13:20– 13:40	K214	Effect of SiCl₄ addition for SiC-CVD from MTS/H₂ (U. Tokyo) *(Stu)Otaka Yuhei, (Stu)Aji Ryosuke, (Stu)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro	CVD SiC Recycle	ST-22	556
13:40– 14:00	K215	Manufacture of SiC_f/SiC by chlorine-free Chemical Vapor Infiltration (U. Tokyo) *(Stu)Aji Ryosuke, (Stu)Otaka Yuhei, (Stu)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro	SiC chemical vapor infiltration tetramethylsilane	ST-22	822
14:00– 14:20	K216	Production and Characterization of Organic Thin Films by Rapid Expansion of Supercritical Solutions (RESS) Using CO₂ (Kanazawa U.) *(Stu)Sakamoto Y., Kobayashi T., Kiyosawa T., (Stu)Kamata W., (Reg)Uchida H.	RESS Organic thin films Supercritical CO2	ST-22	781
(14:20–15:20) (Chair: Kawakami Masato)
14:20– 14:40	K217	Kinetic analysis of TiAlN-CVD process for construction of reaction model (2) (U. Tokyo) *(Stu)Yamaguchi Jun, Hirabaru Tomoko, (Kyocera) (Cor)Kubo Hayato, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Kyocera) (Cor)Tanibuchi Takahito, (U. Tokyo) (Reg)Shimogaki Yukihiro	CVD TiAlN cutting tool	ST-22	153
14:40– 15:00	K218	Synthesis of AlOx thin films by mist-CVD for electrical insulator layer of FETs (Saitama U.) *(Stu)Arifuzzaman Rajib, Shida Tomohiro, Abdul Kuddus, Ueno Keiji, Shirai Hajime	mist-CVD AlOx	ST-22	306
15:00– 15:20	K219	Fabrication of SiO₂ and Al₂O₃ insulator film by mist chemical vapor deposition (U. Tokyo) *(Stu)Kinoshita Sayaka, (U. Tokyo ESC) (Reg)Sakai Enju, (U. Tokyo/U. Tokyo) (Reg)Tsuji Yoshiko	insulator thin-film-transistor mist chemical vapor deposition	ST-22	135

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SCEJ 51st Autumn Meeting (2020)

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