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SCEJ 51st Autumn Meeting (2020)

Program search result : 塩素 : 3 programs

All sessions can be attended from the On-line (Virtual) Meeting Site.
Preprints(Abstracts) are now open. Click the Paper IDs. (Registered participants and invited persons only)
The ID/PW was sent on Sept. 10 (for earlybird registered participants) or on Sept. 23 (for on-site registered participants).
(Aug. 8) Flash session of SY-69 has been cancelled.
(Aug. 24,27) Schedule of SY-74 (X306, X307) and HQ-11 (D301) has been changed.

Title (J) field includes “塩素”; 3 programs are found. (“Poster with Flash” presentations are double-counted.)
The search results are sorted by the start time.

TimePaper
ID		Title / AuthorsKeywordsTopic codeAck.
number
Day 1
11:00– 11:20		B107SiC etching rate and profile adjusted by ClF3 gas
(Yokohama Nat. U.) Irikura Kenta, Hayashi Masaya, *(Reg)Habuka Hitoshi, (Kanto Denka Kogyo) (Cor)Takahashi Yoshinao, (AIST) Kato Tomohisa
SiC
ClF3
Etching
SY-7763
Day 2
13:20– 13:40		J214Study of Photo-Chlorination Reaction by using Micro Space
(Daikin Industries) *(Reg)Ota Toshihiko, (Cor)Ohhigashi Yuuko, (Cor)Kurosu Tatsuya
PhotoChlorination
Micro Space
Microreacter
SY-65747
Day 2
13:40– 14:00		K215Manufacture of SiCf/SiC by chlorine-free Chemical Vapor Infiltration
(U. Tokyo) *(Stu)Aji Ryosuke, (Stu)Otaka Yuhei, (Stu)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro
SiC
chemical vapor infiltration
tetramethylsilane
ST-22822

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SCEJ 51st Autumn Meeting (2020)

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