
SCEJ 52nd Autumn Meeting (Okayama, 2021)
Program search result : Deura Momoko : 6 programs
ST-25,SY-56,SY-64,SY-65,SY-70 are changed from live streaming sessions to online sessions.
The preprints are now open (Sep. 8). These can be viewed by clicking the Paper IDs. The ID/PW sent to the Registered participants (excludes free registration) and invited persons are required.
Authors field exact matches “Deura Momoko”; 6 programs are found. (“Poster with Flash” presentations are double-counted.)
The search results are sorted by the start time.
| Time | Paper ID | Title / Authors | Keywords | Topic code | Ack. number |
Day 1 13:40– 14:00 | VC115 | Effect of additives on photocatalysis and crystallinity of TiO2 made by supercritical fluid deposition
(U. Tokyo) *(Stu)Aji Ryosuke, (Reg)Deura Momoko, (Tokyo Tech) (Reg)Shimoyama Yusuke, (U. Tokyo) (Reg)Shimogaki Yukihiro, (Reg)Momose Takeshi | supercritical fluid deposition photocatalyst crystallinity
| ST-22 | 142 |
Day 1 14:00– 14:20 | VC116 | Examination of precursor vaporization characteristics in pulse-supply ALD
(U. Tokyo) *(Stu)Yamaguchi Jun, (Reg)Deura Momoko, (Reg)Momose Takeshi, (Daikin Industries) (Cor)Matsunaga Takayuki, (Cor)Yamauchi Akiyoshi, (Cor)Kishikawa Yousuke, (U. Tokyo) (Reg)Shimogaki Yukihiro | ALD precursor vaporization
| ST-22 | 594 |
Day 1 16:00– 16:20 | VC122 | SiC Infiltration Process Including Exhaust Gas Recycling for SiCf/SiC CMC
(U. Tokyo) *(Stu)Otaka Yuhei, (Reg)Sato Noboru, (IHI) (Reg)Fukushima Yasuyuki, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Reg)Shimogaki Yukihiro | SiC reuse CVI
| ST-22 | 689 |
Day 1 16:20– 16:40 | VC123 | Development and validation of overall reaction model for polycrystalline SiC-CVD process design
(U. Tokyo) *(Stu)Moroi K., (Stu)Oku T., (Reg)Deura M., (Reg)Momose T., (Reg)Shimogaki Y. | Chemical Vapor Deposition silicon carbide macrocavity method
| ST-22 | 792 |
Day 2 10:40– 11:00 | VN206 | Supercritical fluid deposition of Cu for sub-millimeter-scale features
(U. Tokyo) *(Stu)Huang Yuyuan, (Reg)Deura Momoko, (Tokyo Tech) (Reg)Shimoyama Yusuke, (U. Tokyo) (Reg)Shimogaki Yukihiro, (Reg)Momose Takeshi | supercritical fluid deposition sub-millimeter-scale features
| SY-73 | 685 |
Day 2 11:20– 11:40 | VC208 | Construction of gas-phase elementary reaction mechanism of TiAlN-CVD based on theoretical study
(U. Tokyo) *(Reg)Sato Noboru, (Stu)Yamaguchi Jun, (Kyocera) (Cor)Kubo Hayato, (Cor)Sugiyama Takanori, (U. Tokyo) (Reg)Deura Momoko, (Reg)Momose Takeshi, (Kyocera) (Cor)Tanibuchi Takahito, (U. Tokyo) (Reg)Shimogaki Yukihiro | TiAlN CVD Elementary reaction model
| ST-22 | 785 |
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SCEJ 52nd Autumn Meeting (Okayama, 2021)
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